发明授权
- 专利标题: Externally excited torroidal plasma source
- 专利标题(中): 外部激发环形等离子体源
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申请号: US09636699申请日: 2000-08-11
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公开(公告)号: US06348126B1公开(公告)日: 2002-02-19
- 发明人: Hiroji Hanawa , Yan Ye , Kenneth S Collins , Kartik Ramaswamy , Andrew Nguyen , Tsutomu Tanaka
- 申请人: Hiroji Hanawa , Yan Ye , Kenneth S Collins , Kartik Ramaswamy , Andrew Nguyen , Tsutomu Tanaka
- 主分类号: H01L2100
- IPC分类号: H01L2100
摘要:
A plasma reactor for processing a workpiece includes a chamber adapted to accept processing gases in an evacuated environment including a workpiece support, a hollow conduit defining a wall of the chamber, and having respective ends opening adjacent opposite sides of the workpiece support, and a chamber wall portion in facing relationship to the workpiece support and defining a workpiece processing zone therebetween, the processing zone and the interior of the conduit forming a torroidal interior path, and an RF energy applicator irradiating gas within the chamber to maintain a plasma within the torroidal interior path.
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