发明授权
- 专利标题: Electroplating device for electroplating a work by rotation
- 专利标题(中): 用于通过旋转电镀工件的电镀装置
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申请号: US09605866申请日: 2000-06-29
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公开(公告)号: US06348138B1公开(公告)日: 2002-02-19
- 发明人: Kohshi Yoshimura , Takeshi Nishiuchi , Fumiaki Kikui , Masahiro Asano , Takahiro Isozaki
- 申请人: Kohshi Yoshimura , Takeshi Nishiuchi , Fumiaki Kikui , Masahiro Asano , Takahiro Isozaki
- 优先权: JP11-187325 19990701; JP2000-174537 20000609
- 主分类号: C25D1700
- IPC分类号: C25D1700
摘要:
The present invention provides an electroplating device including an anode inserted through and disposed in a hole provided in a work and communicating with the outside, and a member for rotating the work about its center axis and supplying a plating electric current to the work. Thus, a uniform plated film can be formed on both of the outer and inner surfaces of the work having the hole communicating with the outside such as a ring-shaped work, of which a ring-shaped bonded magnet is representative, by using the electroplating device.
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