发明授权
US06348299B1 RIE etch resistant nonchemically amplified resist composition and use thereof
失效
RIE蚀刻抗化学放大抗蚀剂组合物及其用途
- 专利标题： RIE etch resistant nonchemically amplified resist composition and use thereof
- 专利标题（中）： RIE蚀刻抗化学放大抗蚀剂组合物及其用途
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申请号： US09351428申请日： 1999-07-12
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公开(公告)号： US06348299B1公开(公告)日： 2002-02-19
- 发明人: Ari Aviram , Inna V. Babich
- 申请人： Ari Aviram , Inna V. Babich
- 主分类号： G03C516
- IPC分类号： G03C516
摘要：
Photoresist compositions of improved reactive ion etching comprising polymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkylacrylate and a titanate, zirconate and/or hafnate are provided. The photoresist compositions are used for forming positive lithographic patterns.
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