发明授权
- 专利标题: Spin-valve type thin film element and its manufacturing method
- 专利标题(中): 旋转阀型薄膜元件及其制造方法
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申请号: US09515971申请日: 2000-02-29
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公开(公告)号: US06350487B1公开(公告)日: 2002-02-26
- 发明人: Naoya Hasegawa , Toshihiro Kuriyama
- 申请人: Naoya Hasegawa , Toshihiro Kuriyama
- 优先权: JP9-258718 19970924
- 主分类号: G11B566
- IPC分类号: G11B566
摘要:
A spin-valve type thin film element includes an antiferromagnetic layer, a pinned magnetic layer, a free magnetic layer, a non-magnetic electrically conductive layer, a bias layer, and an electrically conductive layer. The magnetization direction of the pinned magnetic layer in the end regions in relation to the track width is fixed in the direction of the leakage magnetic field from a recording medium, and the magnetization direction of the pinned magnetic layer in the central region is fixed in the direction inclined in relation to the direction of the leakage magnetic field from the recording medium. A method for manufacturing a spin-valve type thin film element includes the steps of forming a multi-layered film, magnetic annealing at a temperature T1, patterning the multi-layered film into a predetermined shape, forming a bias layer on both sides of the multi-layered film, magnetizing the bias layer, annealing without applying a magnetic field at a temperature T2, and magnetizing the bias layer.
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