发明授权
US06354111B1 Press-forming die for glass elements 有权
用于玻璃元件的成型模具

Press-forming die for glass elements
摘要:
A platinum thin film having a thickness of 0.01 to 5 &mgr;m is formed by means of the sputtering method on a press face of a die based on the use of a cemented carbide base material. A nickel thin film having a thickness of 0.05 to 0.5 &mgr;m and a thin film made of an alloy of platinum and iridium are allowed to intervene between the cemented carbide base material and the platinum thin film, if necessary. Alternatively, an alloy thin film having a thickness of 0.01 to 5 &mgr;m, which contains 10 to 70% by weight of iridium and 30 to 90% by weight of one or more species of metals selected from metals of the platinum group except for iridium, may be allowed to intervene between the cemented carbide base material and the platinum thin film.
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