发明授权
- 专利标题： Multiple solvent cleaning system
- 专利标题（中）： 多溶剂清洗系统
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申请号： US09186932申请日： 1998-11-06
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公开(公告)号： US06355113B1公开(公告)日： 2002-03-12
- 发明人: David Nalewajek , Rajat Subhra Basu , David Paul Wilson , Michael Van Der Puy , Ellen Louise Swan , Peter Brian Logsdon , Gary J. Zyhowski , Hepburn Ingham , Daniel Franklin Harnish , Joel Edward Rodgers
- 申请人： David Nalewajek , Rajat Subhra Basu , David Paul Wilson , Michael Van Der Puy , Ellen Louise Swan , Peter Brian Logsdon , Gary J. Zyhowski , Hepburn Ingham , Daniel Franklin Harnish , Joel Edward Rodgers
- 主分类号： B08B308
- IPC分类号： B08B308
摘要：
A non-aqueous cleaning process uses an organic solvent for removing soil or surface contamination from contaminated articles such as printed circuit boards which are cleaned by immersion into a sump compartment of a cleaning tank containing the organic cleaning solvent. The organic solvent is preferably a hydrocarbon solvent. The cleaned articles, now coated with the organic cleaning solvent, are then disposed in a rinsing sump containing a fluorocarbon based rinsing solvent having an affinity for the organic cleaning solvent. The organic solvent is thus removed from the articles which are then dried without waste water as in a conventional solvent vapor degreasing solvent process.
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