发明授权
- 专利标题: Process for forming abrasion-resistant antistatic layer with polyurethane for imaging element
- 专利标题(中): 用于成像元件用聚氨酯形成抗磨抗静电层的方法
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申请号: US09735018申请日: 2000-12-12
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公开(公告)号: US06355406B2公开(公告)日: 2002-03-12
- 发明人: Debasis Majumdar , Dennis J. Eichorst , Kenneth L. Tingler
- 申请人: Debasis Majumdar , Dennis J. Eichorst , Kenneth L. Tingler
- 主分类号: G03C189
- IPC分类号: G03C189
摘要:
A process for forming an abrasion-resistant antistatic layer for an imaging element comprises: adjusting the pH of an aqueous composition of an electronically-conductive polymer to a pH of about 3 to about 10, and combining the pH-adjusted aqueous composition of the electronically-conductive polymer with an aqueous composition at a pH greater than 7 of a polyurethane film-forming binder having a tensile elongation to break of at least 50% and a Young's modulus measured at 2% elongation of at least 50000 psi. The process further comprises applying the resulting coating composition to the imaging element, thereby forming an abrasion-resistant antistatic layer on the element. The antistatic layer coating composition of the present invention can be applied to a wide variety of imaging elements, including, for example, photographic, electrostatographic, photothermographic, migration, electrothermographic, dielectric recording and thermal-dye-transfer imaging elements.
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