发明授权
US06358666B1 Chemically amplified resist composition containing norbornane type low molecular additive
有权
含有降冰片烷型低分子添加剂的化学扩增抗蚀剂组合物
- 专利标题： Chemically amplified resist composition containing norbornane type low molecular additive
- 专利标题（中）： 含有降冰片烷型低分子添加剂的化学扩增抗蚀剂组合物
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申请号： US09616859申请日： 2000-07-14
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公开(公告)号： US06358666B1公开(公告)日： 2002-03-19
- 发明人: Dong Chul Seo , Sun Yi Park , Joo Hyeon Park , Seong Ju Kim
- 申请人： Dong Chul Seo , Sun Yi Park , Joo Hyeon Park , Seong Ju Kim
- 优先权： KR99-59334 19991220
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
This invention relates to a chemically amplified positive photoresist composition comprising a multi copolymer copolymer whose repeating units is represented by the following formula I, a low molecular additive represented by the following formula 2 or 3, an acid generator and a solvent wherein the repeating units comprising X and Y are independent monomers, respectively, selected from the group consisting of the following formulae (II), (III) and (IV):
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