利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

8 条记录 (耗时 0.021 秒)

    Acid generator and thin film composition containing the same
    2.
    发明授权
    Acid generator and thin film composition containing the same 有权

    公开(公告)号：US06987198B2

    公开(公告)日：2006-01-17

    申请号：US10421490

    申请日：2003-04-22

    申请人： Joo Hyeon Park ,  Joung Bum Lee ,  Seong Ju Kim

    发明人： Joo Hyeon Park ,  Joung Bum Lee ,  Seong Ju Kim

    IPC分类号： C07C303/00 ,  C07C307/00 ,  C07C309/00 ,  C07C311/00

    CPC分类号： G03F7/0382 ,  G03F7/0045 ,  G03F7/038

    摘要： The present invention relates to the compounds generating strong acids (described hereafter as “acid generators”) decomposed by heat and the composition of thin film containing the same. Provided are the compounds represented by the structure of formula I and the composition containing the compounds. wherein X is alkyl or aryl group and R is hydrogen atom, hydroxy, alkoxy or alkyl group. The abovementioned acid generators of the present invention generate acid by heat at relatively low temperatures, preventing the change in the ratio of the composition due to evaporation of some components in the composition. Accordingly, it has the advantageous effect that the ratio of components in the composition is controlled and the preparation of the thin film with the wanted properties is simplified.

    Polymer for chemical amplified positive photoresist composition containing the same
    3.
    发明授权
    Polymer for chemical amplified positive photoresist composition containing the same 失效
    用于化学扩增正性光致抗蚀剂组合物的聚合物

    公开(公告)号：US5962186A

    公开(公告)日：1999-10-05

    申请号：US948933

    申请日：1997-10-10

    申请人： Joo Hyeon Park ,  Seong Ju Kim ,  Ji Hong Kim ,  Ki Dae Kim

    发明人： Joo Hyeon Park ,  Seong Ju Kim ,  Ji Hong Kim ,  Ki Dae Kim

    IPC分类号： C08F212/14 ,  C08F220/00 ,  C08F220/30 ,  C08L25/18 ,  C08L33/00 ,  C08L33/14 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  C08F212/02

    CPC分类号： C08F220/30 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

    摘要： A positive chemical amplified photoresist composition comprising as a matrix resin a polymer having the repeating unit of Formula (I) and a photoacid generator. The polymer ranges, in polystyrene-reduced weight average molecular weight, from about 2,000 to 1,000,000. The photoresist composition is possible to develop in alkali and shows excellent sensitivity, resolution and transmissivity to deep uv light in addition to being superior in storage preservativity. The repeating unit is: ##STR1## wherein, R.sub.1, R.sub.2 and R.sub.3 are independently represented by a hydrogen atom or a methyl group; R.sub.4 is a hydrogen atom, an alkyl group or an alkoxy group; R.sub.5, R.sub.6 and R.sub.7 are independently represented by a hydrogen atom, a methyl group, an ethyl group, a t-butyl group, a tetrahydropyranyl group or an alkoxymethylene group; j is an integer of 1-8; k is an integer of 0-8; and l, m and n each represent a mole ratio, satisfying the condition of 1=0.1.about.0.5/l+m+n, m=0.3.about.0.8/l+m+n, n=0.1.about.0.4/l+m+n and l+m+n+l. The acid labile protective group can be the t-butyl group, the tetrahydropyranyl group or the alkoxymethylene group.

    摘要翻译： 一种正性化学放大光致抗蚀剂组合物，其包含作为基质树脂的具有式（I）的重复单元的聚合物和光酸产生剂。 聚苯乙烯换算的聚合物的重均分子量范围为约2,000至1,000,000。 光致抗蚀剂组合物可以在碱中显影，并且除了具有优异的储存保存性之外，对深紫外光具有优异的灵敏度，分辨率和透射率。 重复单元是：其中，R1，R2和R3独立地由氢原子或甲基表示; R4是氢原子，烷基或烷氧基; R5，R6和R7独立地由氢原子，甲基，乙基，叔丁基，四氢吡喃基或烷氧基亚甲基表示; j为1-8的整数; k是0-8的整数; l，m和n各自表示摩尔比，满足条件1 = 0.1 DIFFERENCE 0.5 / l + m + n，m = 0.3差异0.8 / l + m + n，n = 0.1差异0.4 / l + n和l + m + n + 1。 酸不稳定保护基可以是叔丁基，四氢吡喃基或烷氧基亚甲基。

    Carboxylic acid derivatives and their synthesis method
    4.
    发明授权
    Carboxylic acid derivatives and their synthesis method 有权
    羧酸衍生物及其合成方法

    公开(公告)号：US06313327B1

    公开(公告)日：2001-11-06

    申请号：US09425961

    申请日：1999-10-25

    申请人： Dong Seoul Seo ,  Joo Hyeon Park ,  Jae Young Kim ,  Seong Ju Kim

    发明人： Dong Seoul Seo ,  Joo Hyeon Park ,  Jae Young Kim ,  Seong Ju Kim

    IPC分类号： C07J900

    CPC分类号： G03F7/0045 ,  C07C67/11 ,  C07C69/608 ,  C07C69/75 ,  C07C69/753 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07J9/005 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

    摘要： This invention relates to novel carboxylic acid derivatives represented by the following formula I and their synthesis: wherein, R1 is an hydrogen atom, an alkyl group or an alkoxy group of 1 to 20 carbon atoms in a linear, branched or cyclic form; R2 is a carboxy group of 1 to 40 carbon atoms in a linear, branched or cyclic form which is unsubstituted, or substituted into a hydroxy group, an ester group and an ether group. The novel carboxylic acid derivatives are more easily decomposed by acid than t-butyl ester compounds but are not dissolved in basic aqueous solution. According to this invention, carboxylic acid is under condensation with halogen compounds designed to prepare a larger monomolecular compound compared to the conventional method. Further, the condensed site is easily decomposed by acid but is extremely insoluble by basic aqueous solution. The carboxylic acid derivatives in a photoresist composition function not only as a dissolution promoter in the exposed area due to formation of the carboxylic acid, thus enhancement of etching resistance and pattern profile in a resist.

    摘要翻译： 本发明涉及由下式I表示的新型羧酸衍生物及其合成：其中R1为直链，支链或环状的1-20个碳原子的氢原子，烷基或烷氧基; R2是直链状，支链状或环状的1〜40个碳原子的羧基，未取代或取代为羟基，酯基和醚基。新的羧酸衍生物比酸分解更容易分解 叔丁酯化合物，但不溶于碱性水溶液。 根据本发明，与常规方法相比，羧酸与设计用于制备较大单分子化合物的卤素化合物缩合。 此外，凝聚位点容易被酸分解，但由碱性水溶液极不溶解。 光致抗蚀剂组合物中的羧酸衍生物由于形成羧酸而不仅作为暴露区域中的溶解促进剂起作用，因此抗蚀剂中的耐腐蚀性和图案轮廓增强。

    INTEGRATION AUTHENTICATION METHOD AND INTEGRATION AUTHENTICATION SERVER
    7.
    发明申请
    INTEGRATION AUTHENTICATION METHOD AND INTEGRATION AUTHENTICATION SERVER 审中-公开
    集成认证方法和集成认证服务器

    公开(公告)号：US20100132021A1

    公开(公告)日：2010-05-27

    申请号：US12451222

    申请日：2008-05-02

    申请人： Seong Ju Kim

    发明人： Seong Ju Kim

    IPC分类号： H04L9/32 ,  G06F7/04

    CPC分类号： G06F21/34 ,  G06F21/41

    摘要： Provided are an integrated authentication method and an integrated authentication server. The integrated authentication method using the integrated authentication server includes receiving integrated authentication request information and a company code for password authentication by the integrated authentication server, requesting a serial number of a predetermined authentication device and determining whether the received company code is identical to a provider company code in response to the received serial number, if the received company code is identical to the provider company code, requesting generation of a test password and determining whether a received test password is identical to a reference password, and if the test password is identical to the reference password, approving password authentication using the authentication device at a provider company corresponding to the provider company code. The integrated authentication method and the integrated authentication server enable all types of financial trades and e-commerce using a single authentication device authenticated by the integrated authentication server and allow the authentication device to avoid the risk of hacking. Moreover, companies commonly bear an authentication fee for the authentication device, thereby promoting the spread and utilization of the authentication device.

    摘要翻译： 提供集成的认证方法和集成认证服务器。 使用集成认证服务器的集成认证方法包括接收集成认证请求信息和集成认证服务器进行密码认证的公司代码，请求预定认证设备的序列号，并确定接收到的公司代码是否与提供商公司相同 如果接收到的公司代码与提供商公司代码相同，请求生成测试密码并确定接收到的测试密码是否与参考密码相同，并且如果测试密码与 参考密码，在提供商公司代码对应的提供商公司使用认证设备批准密码认证。 集成认证方法和集成认证服务器使用由集成认证服务器认证的单一认证设备，实现所有类型的金融交易和电子商务，并允许认证设备避免入侵的风险。 此外，公司通常对认证设备承担认证费用，从而促进认证设备的传播和利用。