发明授权
US06362013B1 Semiconductor inspection apparatus and method of specifying attributes of dies on wafer in semiconductor inspection apparatus 失效
半导体检查装置及半导体检查装置中的晶片上的金属模具的属性的方法

  • 专利标题: Semiconductor inspection apparatus and method of specifying attributes of dies on wafer in semiconductor inspection apparatus
  • 专利标题(中): 半导体检查装置及半导体检查装置中的晶片上的金属模具的属性的方法
  • 申请号: US09557846
    申请日: 2000-04-26
  • 公开(公告)号: US06362013B1
    公开(公告)日: 2002-03-26
  • 发明人: Nobuhiko Yoshimura
  • 申请人: Nobuhiko Yoshimura
  • 优先权: JP11-121184 19990428
  • 主分类号: H01L2166
  • IPC分类号: H01L2166
Semiconductor inspection apparatus and method of specifying attributes of dies on wafer in semiconductor inspection apparatus
摘要:
The data of a plurality of attributes of dies on a semiconductor wafer under a parametric test can be managed in a unified manner, and edited and displayed on a real-time basis with one tool. A semiconductor inspection apparatus has a memory for expanding and storing attribute data of dies as data of at least three values for selecting and specifying attributes of dies on a wafer from a plurality of attributes, and a display controller for allowing an operator to select any of the attributes of dies within one displayed image, and reflecting selected attributes immediately as die characteristics in the displayed image. A method of specifying attributes of dies on a wafer in such a semiconductor inspection apparatus is also disclosed.
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