发明授权
- 专利标题: Workpiece holder for polishing, method for producing the same, method for polishing workpiece, and polishing apparatus
- 专利标题(中): 用于抛光的工件支架,其制造方法,抛光工件的方法和抛光装置
-
申请号: US09581707申请日: 2000-06-16
-
公开(公告)号: US06386957B1公开(公告)日: 2002-05-14
- 发明人: Hisashi Masumura , Kouichi Tanaka , Fumio Suzuki , Kouzi Morita , Kouichi Okamura , Naotaka Toyama
- 申请人: Hisashi Masumura , Kouichi Tanaka , Fumio Suzuki , Kouzi Morita , Kouichi Okamura , Naotaka Toyama
- 优先权: JP10-310121 19981030
- 主分类号: B24B100
- IPC分类号: B24B100
摘要:
By improving the material of workpiece holder body of a workpiece holder for polishing that holds a workpiece by vacuum adsorption, and the material of resin film for coating a workpiece holding surface of the holder, and developing a method for coating the surface with a resin, which does not cause blocking of perforated holes of the holder body with the resin during the resin coating process, there are provided a workpiece holder for polishing having a workpiece holding surface of high precision, and a method for producing it. According to the present invention, there are provided a workpiece holder for polishing having a workpiece holder body provided with multiple perforated holes for holding a workpiece by vacuum adsorption, wherein a holding surface of the holder body is coated with a coating film formed by applying a thermosetting resin on the holding surface and curing it with heating, and a surface of the coating film is polished, and a method for producing it.
信息查询