发明授权
- 专利标题: Method of removing moisture in gas supply system
- 专利标题(中): 排气系统除湿方法
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申请号: US09848208申请日: 2001-05-04
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公开(公告)号: US06387158B2公开(公告)日: 2002-05-14
- 发明人: Nobukazu Ikeda , Akihiro Morimoto , Yukio Minami , Teruo Honiden , Kouji Kawada , Katunori Komehana , Touru Hirai , Michio Yamaji
- 申请人: Nobukazu Ikeda , Akihiro Morimoto , Yukio Minami , Teruo Honiden , Kouji Kawada , Katunori Komehana , Touru Hirai , Michio Yamaji
- 优先权: JP11-258547 19990913
- 主分类号: F17D314
- IPC分类号: F17D314
摘要:
A method of removing moisture efficiently in the gas supply system by evacuation at normal temperature without using the baking method. The method involves flowing a gas to remove moisture in the gas supply system with the flow pressure of the gas to remove moisture set at not lower than a minimum pressure at which the gas flow becomes viscous and not higher than a water saturated vapor pressure at a flow temperature of the gas to remove moisture. The gas to remove moisture achieves a viscous flow when a mean free path of gas molecules is smaller than a diameter of piping of the gas supply system. If the gas for removing moisture is evacuated at normal temperature under such conditions, the adsorbed moisture on an inside surface of the piping and in the valves and filters can be removed effectively.
公开/授权文献
- US20020000161A1 Method of removing moisture in gas supply system 公开/授权日:2002-01-03
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