发明授权
- 专利标题： X-ray lens system
- 专利标题（中）： X光透镜系统
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申请号： US09289493申请日： 1999-04-09
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公开(公告)号： US06389100B1公开(公告)日： 2002-05-14
- 发明人: Boris Verman , Licai Jiang , Bonglea Kim , Karsten Dan Joensen
- 申请人： Boris Verman , Licai Jiang , Bonglea Kim , Karsten Dan Joensen
- 主分类号： G21K106
- IPC分类号： G21K106
摘要：
A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
公开/授权文献
- US20020044626A1 X-RAY LENS SYSTEM 公开/授权日：2002-04-18
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