发明授权
- 专利标题: Surface treating process
- 专利标题(中): 表面处理工艺
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申请号: US09568580申请日: 2000-05-11
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公开(公告)号: US06391386B1公开(公告)日: 2002-05-21
- 发明人: Takeshi Nishiuchi , Yoshimi Tochishita , Fumiaki Kikui , Mitsuo Kizawa
- 申请人: Takeshi Nishiuchi , Yoshimi Tochishita , Fumiaki Kikui , Mitsuo Kizawa
- 优先权: JP11-134998 19990514; JP11-134999 19990514; JP2000-117771 20000419
- 主分类号: C23C1600
- IPC分类号: C23C1600
摘要:
A surface treating process according to the present invention, a vapor deposited film is formed from an easily oxidizable vapor-depositing material on the surface of a work by evaporating the vapor-depositing material in a state in which the vapor deposition controlling gas has been supplied to at least zones near a melting/evaporating source and the work within a treating chamber. Thus, the vapor deposited film can be formed stably on the surface of a desired work without requirement of a long time for providing a high degree of vacuum and without use of a special apparatus. In addition, the use of the surface treating process ensures that a corrosion resistance can be provided to a rare earth metal-based permanent magnet extremely liable to be oxidized, without degradation of a high magnetic characteristic of the magnet.
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