-
公开(公告)号：US07270714B2
公开(公告)日：2007-09-18
申请号：US10615381
申请日：2003-07-09
IPC分类号： C23C14/24
CPC分类号： C23C14/223 , C23C14/16 , C23C14/246 , C23C14/505 , H01F41/026 , Y10S428/928 , Y10S428/938 , Y10T428/12063 , Y10T428/12465 , Y10T428/12778
摘要： A surface treating process according to the present invention, a vapor deposited film is formed from an easily oxidizable vapor-depositing material on the surface of a work by evaporating the vapor-depositing material in a state in which the vapor deposition controlling gas has been supplied to at least zones near a melting/evaporating source and the work within a treating chamber. Thus, the vapor deposited film can be formed stably on the surface of a desired work without requirement of a long time for providing a high degree of vacuum and without use of a special apparatus. In addition, the use of the surface treating process ensures that a corrosion resistance can be provided to a rare earth metal-based permanent magnet extremely liable to be oxidized, without degradation of a high magnetic characteristic of the magnet. A surface treating apparatus according to the present invention includes a melting/evaporating source for melting and evaporating a wire-shaped vapor-depositing material containing a vapor deposition controlling gas, and a member for retaining a work on which the vapor-depositing material is deposited. The melting/evaporating source and the work retaining member are disposed in a treating chamber of the surface treating chamber. The apparatus further includes a vapor-depositing material supply means for supplying the wire-shaped vapor-depositing material containing the vapor deposition controlling gas to the melting-evaporating source.
摘要翻译： 根据本发明的表面处理方法，通过在已经供应气相沉积控制气体的状态下蒸发气相沉积材料，通过易于氧化的气相沉积材料在工件表面上形成气相沉积膜 至少在熔化/蒸发源附近的区域和处理室内的工作。 因此，可以在期望的工件的表面上稳定地形成蒸镀膜，而不需要长时间提供高真空度并且不需要特殊的装置。 此外，通过使用表面处理工序，能够确保对极易于氧化的稀土类金属系永磁体提供耐腐蚀性，而不会降低磁铁的高磁特性。 根据本发明的表面处理装置包括用于熔化和蒸发含有气相沉积控制气体的线状气相沉积材料的熔化/蒸发源，以及用于保持沉积有沉积材料的工件的构件 。 熔化/蒸发源和工件保持构件设置在表面处理室的处理室中。 该装置还包括用于将含有蒸镀控制气体的线状气相沉积材料供给到熔化蒸发源的气相沉积材料供给装置。
-
2.发明授权Surface treating process, surface treating apparatus, vapor-depositing material, and rare earth metal-based permanent magnet with surface treated 有权表面处理工艺，表面处理装置，气相沉积材料和表面处理的稀土金属基永磁体公开(公告)号：US06617044B2
公开(公告)日：2003-09-09
申请号：US10094650
申请日：2002-03-12
IPC分类号： B32B900
CPC分类号： C23C14/223 , C23C14/16 , C23C14/246 , C23C14/505 , H01F41/026 , Y10S428/928 , Y10S428/938 , Y10T428/12063 , Y10T428/12465 , Y10T428/12778
摘要： A surface treating process according to the present invention, a vapor deposited film is formed from an easily oxidizable vapor-depositing material on the surface of a work by evaporating the vapor-depositing material in a state in which the vapor deposition controlling gas has been supplied to at least zones near a melting/evaporating source and the work within a treating chamber. Thus, the vapor deposited film can be formed stably on the surface of a desired work without requirement of a long time for providing a high degree of vacuum and without use of a special apparatus. In addition, the use of the surface treating process ensures that a corrosion resistance can be provided to a rare earth metal-based permanent magnet extremely liable to be oxidized, without degradation of a high magnetic characteristic of the magnet. A surface treating apparatus according to the present invention includes a melting/evaporating source for melting and evaporating a wire-shaped vapor-depositing material containing a vapor deposition controlling gas, and a member for retaining a work on which the vapor-depositing material is deposited. The melting/evaporating source and the work retaining member are disposed in a treating chamber of the surface treating chamber. The apparatus further includes a vapor-depositing material supply means for supplying the wire-shaped vapor-depositing material containing the vapor deposition controlling gas to the melting-evaporating source.
摘要翻译： 根据本发明的表面处理方法，通过在已经供应气相沉积控制气体的状态下蒸发气相沉积材料，通过易于氧化的气相沉积材料在工件表面上形成气相沉积膜 至少在熔化/蒸发源附近的区域和处理室内的工作。 因此，可以在期望的工件的表面上稳定地形成蒸镀膜，而不需要长时间提供高真空度并且不需要特殊的装置。 此外，通过使用表面处理工序，能够确保对极易于氧化的稀土类金属系永磁体提供耐腐蚀性，而不会降低磁铁的高磁特性。 根据本发明的表面处理装置包括用于熔化和蒸发含有气相沉积控制气体的线状气相沉积材料的熔化/蒸发源，以及用于保持沉积有沉积材料的工件的构件 。 熔化/蒸发源和工件保持构件设置在表面处理室的处理室中。 该装置还包括用于将含有蒸镀控制气体的线状气相沉积材料供给到熔化蒸发源的气相沉积材料供给装置。
-
公开(公告)号：US06391386B1
公开(公告)日：2002-05-21
申请号：US09568580
申请日：2000-05-11
IPC分类号： C23C1600
CPC分类号： C23C14/223 , C23C14/16 , C23C14/246 , C23C14/505 , H01F41/026 , Y10S428/928 , Y10S428/938 , Y10T428/12063 , Y10T428/12465 , Y10T428/12778
摘要： A surface treating process according to the present invention, a vapor deposited film is formed from an easily oxidizable vapor-depositing material on the surface of a work by evaporating the vapor-depositing material in a state in which the vapor deposition controlling gas has been supplied to at least zones near a melting/evaporating source and the work within a treating chamber. Thus, the vapor deposited film can be formed stably on the surface of a desired work without requirement of a long time for providing a high degree of vacuum and without use of a special apparatus. In addition, the use of the surface treating process ensures that a corrosion resistance can be provided to a rare earth metal-based permanent magnet extremely liable to be oxidized, without degradation of a high magnetic characteristic of the magnet.
摘要翻译： 根据本发明的表面处理方法，通过在已经供应气相沉积控制气体的状态下蒸发气相沉积材料，通过易于氧化的气相沉积材料在工件表面上形成气相沉积膜 至少在熔化/蒸发源附近的区域和处理室内的工作。 因此，可以在期望的工件的表面上稳定地形成蒸镀膜，而不需要长时间提供高真空度并且不需要特殊的装置。 此外，通过使用表面处理工序，能够确保对极易于氧化的稀土类金属系永磁体提供耐腐蚀性，而不会降低磁铁的高磁特性。
-
公开(公告)号：US06960368B2
公开(公告)日：2005-11-01
申请号：US11049961
申请日：2005-02-04
CPC分类号： C23C14/505 , H01F1/0556 , H01F41/026
摘要： With the deposited-film forming apparatus according to the first embodiment of the present invention, the distance between the tubular barrel and the evaporating section can be varied, unlike the prior art deposited-film forming apparatus and hence, the efficient formation of the deposited film on the surface of each of the work pieces accommodated in the tubular barrel and the inhibition of the softening of the formed film can be achieved simultaneously. Therefore, it is possible to inhibit the damaging of the deposited film formed on the surface of each of the work pieces and the production of projections on the deposited film, and to form a deposited film at a high quality in respect of a corrosion resistance and the like and at low cost.With the deposited-film forming apparatus according to the second embodiment of the present invention, the distance between the accommodating section defined in the tubular barrel and the evaporating section can be varied and hence, this deposited-film forming apparatus also exhibits an effect similar to that in the deposited-film forming apparatus according to the first embodiment of the present invention.
摘要翻译： 利用根据本发明第一实施例的沉积膜形成装置，可以改变管状筒和蒸发部之间的距离，这与现有技术的沉积膜形成装置不同，因此有效地形成沉积膜 在容纳在管状筒体中的每个工件的表面上，可以同时实现对形成的膜的软化的抑制。 因此，可以抑制在每个工件的表面上形成的沉积膜的破坏和沉积膜上的突起的产生，并且在耐腐蚀性方面形成高质量的沉积膜， 喜欢和低成本。 利用根据本发明第二实施例的沉积膜形成装置，可以改变限定在管状筒体中的容纳部分与蒸发部分之间的距离，因此该沉积膜形成装置也具有类似于 在根据本发明的第一实施例的沉积膜形成装置中。
-
公开(公告)号：US20050126495A1
公开(公告)日：2005-06-16
申请号：US11049961
申请日：2005-02-04
CPC分类号： C23C14/505 , H01F1/0556 , H01F41/026
摘要： With the deposited-film forming apparatus according to the first embodiment of the present invention, the distance between the tubular barrel and the evaporating section can be varied, unlike the prior art deposited-film forming apparatus and hence, the efficient formation of the deposited film on the surface of each of the work pieces accommodated in the tubular barrel and the inhibition of the softening of the formed film can be achieved simultaneously. Therefore, it is possible to inhibit the damaging of the deposited film formed on the surface of each of the work pieces and the production of projections on the deposited film, and to form a deposited film at a high quality in respect of a corrosion resistance and the like and at low cost. With the deposited-film forming apparatus according to the second embodiment of the present invention, the distance between the accommodating section defined in the tubular barrel and the evaporating section can be varied and hence, this deposited-film forming apparatus also exhibits an effect similar to that in the deposited-film forming apparatus according to the first embodiment of the present invention.
-
公开(公告)号：US06872260B2
公开(公告)日：2005-03-29
申请号：US09813129
申请日：2001-03-21
CPC分类号： C23C14/505 , H01F1/0556 , H01F41/026
摘要： With the deposited-film forming apparatus according to the first embodiment of the present invention, the distance between the tubular barrel and the evaporating section can be varied, unlike the prior art deposited-film forming apparatus and hence, the efficient formation of the deposited film on the surface of each of the work pieces accommodated in the tubular barrel and the inhibition of the softening of the formed film can be achieved simultaneously. Therefore, it is possible to inhibit the damaging of the deposited film formed on the surface of each of the work pieces and the production of projections on the deposited film, and to form a deposited film at a high quality in respect of a corrosion resistance and the like and at low cost.With the deposited-film forming apparatus according to the second embodiment of the present invention, the distance between the accommodating section defined in the tubular barrel and the evaporating section can be varied and hence, this deposited-film forming apparatus also exhibits an effect similar to that in the deposited-film forming apparatus according to the first embodiment of the present invention.
摘要翻译： 利用根据本发明第一实施例的沉积膜形成装置，可以改变管状筒和蒸发部之间的距离，这与现有技术的沉积膜形成装置不同，因此有效地形成沉积膜 在容纳在管状筒体中的每个工件的表面上，可以同时实现对形成的膜的软化的抑制。 因此，可以抑制在每个工件的表面上形成的沉积膜的破坏和沉积膜上的突起的产生，并且在耐腐蚀性方面形成高质量的沉积膜， 通过根据本发明第二实施例的沉积膜形成装置，可以改变限定在管状筒体中的容纳部分与蒸发部分之间的距离，因此该沉积膜形成 装置也表现出与根据本发明的第一实施例的沉积膜形成装置类似的效果。
-
公开(公告)号：US06861089B2
公开(公告)日：2005-03-01
申请号：US10311353
申请日：2001-07-06
CPC分类号： C23C14/223 , C23C14/505 , C23C14/541 , H01F41/026
摘要： A method of inhibiting production of projections in a metal deposited-film according to the present invention is characterized by using a vapor deposition apparatus comprising, in a vacuum-treating chamber, an evaporating section for a depositing material, and an accommodating member and/or a holding member for accommodation and/or hold of work pieces, respectively, and, in depositing a metal depositing material on each of the surface of the work pieces with the accommodating member and/or the holding member being made rotated about the horizontal rotational axis thereof, carrying out vapor deposition with a Vickers hardness of a film formed on each of the surface of the work pieces maintained at 25 or more. According to the present invention, production of projections in a metal deposited-film can be effectively inhibited when forming the metal deposited-film of aluminum, zinc or the like on the surface of a work piece such as a rare earth metal-based permanent magnet.
摘要翻译： 根据本发明的抑制在金属沉积膜中产生突起的方法的特征在于使用一种蒸镀装置，在真空处理室中包括用于沉积材料的蒸发部分和一个容纳部件和/或 用于分别容纳和/或保持工件的保持构件，并且在使工件的每个表面上沉积金属沉积材料的同时，使容纳构件和/或保持构件围绕水平旋转轴线旋转 进行蒸镀，其中维氏硬度为维氏25度以上的工件表面上形成的膜。 根据本发明，当在诸如稀土金属基永磁体的工件的表面上形成铝，锌等的金属沉积膜时，可以有效地抑制金属沉积膜中的突起的制造 。
-
8.发明授权Process for producing rare earth metal-based permanent magnet having corrosion-resistant film 有权具有耐腐蚀膜的稀土金属类永磁体的制造方法公开(公告)号：US06376089B1
公开(公告)日：2002-04-23
申请号：US09649593
申请日：2000-08-29
IPC分类号： B32B1508
CPC分类号： H01F1/059 , H01F1/057 , H01F1/344 , H01F41/026 , Y10S428/90 , Y10S428/926 , Y10S428/928 , Y10T428/31663 , Y10T428/31678
摘要： The present invention provides a process for producing a rare earth metal-based permanent magnet having, on its surface, a corrosion-resistant film containing inorganic fine particles having a specific average particle size and dispersed in a film phase formed from a silicon compound. In a heat treatment for forming a film by a hydrolyzing reaction and a thermally decomposing reaction of the silicon compound, followed by a polymerizing reaction, a stress is generated within the film by the shrinkage of the film. In the corrosion-resistant film formed by the producing process according to the present invention, however, such stress is dispersed by the presence of the inorganic fine particles and hence, the generation of physical defects such as cracks is inhibited. In addition, voids between the adjacent inorganic fine particles are filled with the film phase formed from the silicon compound and hence, the formed film is dense. Further, no alkali ions are contained in the film and hence, the film itself is excellent in corrosion resistance. Yet further, the film has an excellent close adhesion to the magnet achieved by an excellent reactivity with the surface of the magnet.
摘要翻译： 本发明提供一种稀土金属类永久磁铁的制造方法，其表面具有含有特定平均粒径的无机微粒并分散在由硅化合物形成的膜相中的耐腐蚀性膜。 在通过水解反应形成膜和硅化合物的热分解反应的热处理中，随后进行聚合反应，通过膜的收缩在膜内产生应力。 然而，在通过本发明的制造方法形成的耐腐蚀膜中，通过存在无机细颗粒而使这种应力分散，因此抑制诸如裂纹的物理缺陷的产生。 此外，相邻的无机细粒之间的空隙填充有由硅化合物形成的膜相，因此形成的膜是致密的。 此外，膜中不含有碱离子，因此膜本身的耐腐蚀性优异。 此外，该膜通过与磁体表面的优异反应性而获得与磁体的极好的紧密粘合性。
-
9.发明授权Process for surface treatment of hollow work having hole communicating with outside 有权具有与外部连通的孔的中空工件的表面处理工艺公开(公告)号：US06355313B1
公开(公告)日：2002-03-12
申请号：US09512655
申请日：2000-02-24
IPC分类号： B29C3508
CPC分类号： H01F41/026 , C23C10/02 , C23C10/34 , Y10T428/12063 , Y10T428/12465
摘要： A hollow work having a hole communicating with the outside and a fine metal powder producing material are placed into a treating vessel, where the fine metal powder producing material is brought into flowing contact with the surface of the work, thereby adhering a fine metal powder produced from the fine metal powder producing material to the surface of the work. The hollow work may be a ring-shaped bonded magnet. Thus, a film having an excellent corrosion resistance can be formed without use of a third component such as a resin and a coupling agent by providing an electric conductivity to the entire surface of the magnet, i.e., not only to the outer surface (including end faces) but also to the inner surface of the magnet and subjecting the magnet to an electroplating treatment.
摘要翻译： 将具有与外部连通的孔的中空工件和精细的金属粉末生成材料放置在处理容器中，使金属粉末生成材料与工件的表面流动接触，从而粘附生产的细金属粉末 从精细的金属粉末生产材料到工作的表面。 中空的工件可以是环形粘结磁体。 因此，通过向磁体的整个表面提供导电性，即不仅可以形成具有优异耐腐蚀性的膜，而且不需要使用诸如树脂和偶联剂的第三组分， 面），而且还与磁体的内表面并对磁体进行电镀处理。
-
公开(公告)号：US06281774B1
公开(公告)日：2001-08-28
申请号：US09554013
申请日：2000-05-09
IPC分类号： H01F702
CPC分类号： H01F41/026 , Y10S428/90 , Y10T428/256 , Y10T428/265
摘要： The present invention provides an Fe—B—R based permanent magnet, which has a chemical conversion coating film formed on its surface with an aluminum film interposed therebetween, the chemical conversion coating film containing at least one of titanium and zirconium, phosphorus, oxygen and fluorine as constituting elements, and a process for producing such an Fe—B—R based permanent magnet. In the permanent magnet, the chemical conversion coating film is adhered firmly to the magnet with the aluminum film interposed therebetween and hence, the magnet is excellent in corrosion resistance. Even if the magnet is left to stand for a long time under high-temperature and high-humidity conditions of a temperature of 80° C. and a relative humidity of 90%, the magnet exhibits a stable high magnetic characteristic which cannot deteriorate. Moreover, the film is free from hexa-valent chromium.
摘要翻译： 本发明提供一种Fe-BR系永久磁铁，其特征在于，具有在其表面形成有铝膜的化学转化膜，所述化学转化膜含有钛，锆，磷，氧，氟中的至少一种，作为 构成元素，以及这种Fe-BR类永久磁铁的制造方法。 在永久磁铁中，化学转化膜与铝磁性膜牢固地粘附在磁铁上，因此，磁铁的耐腐蚀性优异。 即使磁铁在温度80℃，相对湿度90％的高温高湿条件下长时间放置，磁铁表现出稳定的高磁特性，不会劣化。 此外，该膜不含六价铬。
-
-
-
-
-
-
-
-
-
搜索结果
46 条记录 (耗时 0.021 秒)
