发明授权
- 专利标题： Process for developing exposed radiation-sensitive printing plate precursors
- 专利标题（中）： 用于开发暴露的辐射敏感印版前体的方法
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申请号： US09706180申请日： 2000-11-03
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公开(公告)号： US06391530B1公开(公告)日： 2002-05-21
- 发明人: Hans-Joachim Timpe , Ulrich Fiebag
- 申请人： Hans-Joachim Timpe , Ulrich Fiebag
- 主分类号： G03F732
- IPC分类号： G03F732
摘要：
A replenisher composition developing exposed radiation-sensitive printing plate precursors for plate/developer systems in which the electrical conductivity of the developer does not decrease to the same extend as the activity of the developer decreases or even increases is disclosed. A method for developing exposed radiation-sensitive printing plates using the replenisher composition is also disclosed.
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