发明授权
- 专利标题: Semi-insulating silicon carbide without vanadium domination
- 专利标题(中): 半绝缘碳化硅无钒支配
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申请号: US09866129申请日: 2001-05-25
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公开(公告)号: US06396080B2公开(公告)日: 2002-05-28
- 发明人: Calvin H. Carter, Jr. , Mark Brady , Valeri F. Tsvetkov
- 申请人: Calvin H. Carter, Jr. , Mark Brady , Valeri F. Tsvetkov
- 主分类号: H01L310312
- IPC分类号: H01L310312
摘要:
A semi-insulating bulk single crystal of silicon carbide is disclosed that has a resistivity of at least 5000 &OHgr;-cm at room temperature and a concentration of trapping elements that create states at least 700 meV from the valence or conduction band that is below the amounts that will affect the resistivity of the crystal, preferably below detectable levels. A method of forming the crystal is also disclosed, along with some resulting devices that take advantage of the microwave frequency capabilities of devices formed using substrates according to the invention.
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