发明授权
- 专利标题: Nanomachining method for integrated circuits
- 专利标题(中): 集成电路的纳米加工方法
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申请号: US09755005申请日: 2001-01-05
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公开(公告)号: US06403388B1公开(公告)日: 2002-06-11
- 发明人: Jeffrey D. Birdsley , Michael R. Bruce , Brennan V. Davis , Rosalinda M. Ring , Daniel L. Stone
- 申请人: Jeffrey D. Birdsley , Michael R. Bruce , Brennan V. Davis , Rosalinda M. Ring , Daniel L. Stone
- 主分类号: H01L2166
- IPC分类号: H01L2166
摘要:
A system and method provides for effective analysis of an integrated circuit having silicon on insulator (SOI) structure. According to one example embodiment of the present invention, the system includes a system (e.g., a nanomachining arrangement) adapted to remove a selected portion of the backside of a semiconductor device having SOI structure, and to electrically isolate a selected portion of circuitry on the SOI semiconductor device circuitry side. The isolated circuitry then is analyzed.
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