- 专利标题: Semiconductor device and method for fabricating the same
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申请号: US09639754申请日: 2000-08-15
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公开(公告)号: US06403991B1公开(公告)日: 2002-06-11
- 发明人: Atsushi Kurokawa , Masao Yamane , Kazuhiro Mochizuki
- 申请人: Atsushi Kurokawa , Masao Yamane , Kazuhiro Mochizuki
- 优先权: JP11-232378 19990819; JP2000-216848 20000718
- 主分类号: H01L31072
- IPC分类号: H01L31072
摘要:
A bipolar transistor device with a large current capacity is formed by connecting a plurality of transistor elements to each other in parallel, each transistor element having a collector layer, a base layer, and an emitter layer formed respectively in a semiconductor substrate. In the bipolar transistor device, the base layers of a plurality of the transistor elements are extended in parallel to each other and those base layers are separated from each other. In each separated base layer, a first base electrode is formed on a part of the base layer which is separated from an emitter junction with the emitter layer, and a second base electrode is formed on another portion of the base layer closer to the emitter junction than the first base electrode. To dispose the base electrodes of a plurality of the transistor elements in parallel to each other, a base wiring is connected to the first base electrodes of those elements electrically. Consequently, a ballast resistor that causes no variation in the resistance value can be connected to each of a plurality of the transistor elements.
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