发明授权
- 专利标题: Heat treatment method and heat treatment apparatus
- 专利标题(中): 热处理方法和热处理装置
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申请号: US09620912申请日: 2000-07-20
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公开(公告)号: US06409503B1公开(公告)日: 2002-06-25
- 发明人: Seiichi Yoshida , Takashi Tanahashi , Akira Onodera , Motoki Akimoto
- 申请人: Seiichi Yoshida , Takashi Tanahashi , Akira Onodera , Motoki Akimoto
- 优先权: JP11-205551 19990721; JP2000-117288 20000419
- 主分类号: F27D300
- IPC分类号: F27D300
摘要:
When carrying workpieces from a loading area in which the workpieces are handled into a heat treatment furnace to make the workpieces subjected to a heat treatment process using a predetermined process gas, the loading area is evacuated and controlled at a predetermined low negative pressure. An exhaust for evacuating the loading area is connected to the loading area, and a controller controls the exhaust so that the loading area is maintained at the predetermined low negative pressure. A specific gas and particles contained in a gas discharged from the loading area are removed by filters.
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