Invention Grant
US6414978B2 Discharge unit for a high repetition rate excimer or molecular fluorine laser
有权
用于高重复率准分子或分子氟激光的放电单元
- Patent Title: Discharge unit for a high repetition rate excimer or molecular fluorine laser
- Patent Title (中): 用于高重复率准分子或分子氟激光的放电单元
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Application No.: US82629601Application Date: 2001-04-03
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Publication No.: US6414978B2Publication Date: 2002-07-02
- Inventor: BRAGIN IGOR , BERGER VADIM , STAMM UWE , REBHAN ULRICH
- Applicant: LAMBDA PHYSIK AG
- Priority: US45367099 1999-12-03; US12822799 1999-04-07
- Main IPC: H01S3/032
- IPC: H01S3/032 ; H01S3/036 ; H01S3/038 ; H01S3/097 ; H01S3/0971 ; H01S3/225 ; H01S3/22

Abstract:
A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.
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