发明授权
- 专利标题: Chemically amplified resist compositions
- 专利标题(中): 化学扩增抗蚀剂组合物
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申请号: US09675500申请日: 2000-09-29
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公开(公告)号: US06416927B1公开(公告)日: 2002-07-09
- 发明人: Sang-jun Choi , Chun-geun Park , Young-bum Koh
- 申请人: Sang-jun Choi , Chun-geun Park , Young-bum Koh
- 优先权: KR96-45396 19961011
- 主分类号: G03F7004
- IPC分类号: G03F7004
摘要:
Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.
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