公开(公告)号：US6114084A

公开(公告)日：2000-09-05

申请号：US165061

申请日：1998-10-02

申请人： Yool Kang ,  Sang-Jun Choi ,  Dong-Won Jung ,  Chun-Geun Park ,  Young-Bum Koh

发明人： Yool Kang ,  Sang-Jun Choi ,  Dong-Won Jung ,  Chun-Geun Park ,  Young-Bum Koh

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03C1/492

CPC分类号： G03F7/039 ,  G03F7/0045

摘要： Copolymers and terpolymers are used in chemically amplified resists. The terpolymers are of the formula: ##STR1## wherein R.sub.3 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R.sub.4 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof, R.sub.5 is selected from the group consisting of hydrogen and methyl; R.sub.6 is selected from the group consisting of t-butyl and tetrahydropyranyl; M and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5. Also, a resist composition for use in a chemically amplified resist, which comprises a photoacid generator and a polymer having the formula: ##STR2## wherein x is selected from the group consisting of C.sub.5 to C.sub.8 cyclic or alicyclic composition, R.sub.7 is selected from the group consisting of hydrogen and methyl; R.sub.4 is selected from the group consisting of t-butyl, tetrahydropyranyl and adamantyl; m and n are each integers; and the ratio n/(m+n) ranges from about 0.1 to about 0.5.

摘要翻译： 共聚物和三元共聚物用于化学增强抗蚀剂。 三元共聚物具有下式：其中R 3选自氢和C 1至C 10脂族烃，其中所述脂族烃含有选自氢，羟基，羧酸，羧酸酐及其组合的取代基 ; R 4选自氢和C 1至C 10脂族烃，其中所述脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基，R 5选自 的氢和甲基; R6选自叔丁基和四氢吡喃基; M和n分别是整数; 并且其中n /（m + n）为约0.1至约0.5。 另外，用于化学放大抗蚀剂的抗蚀剂组合物，其包含光致酸发生剂和具有下式的聚合物：其中x选自C5至C8环状或脂环族组合物，R7选自由以下组成的组： 氢和甲基; R4选自叔丁基，四氢吡喃基和金刚烷基; m和n分别为整数; n /（m + n）的比例为约0.1至约0.5。

公开(公告)号：US5856411A

公开(公告)日：1999-01-05

申请号：US665231

申请日：1996-06-17

申请人： Sang-jun Choi ,  Chun-geun Park

发明人： Sang-jun Choi ,  Chun-geun Park

IPC分类号： G03F7/039 ,  C08F4/04 ,  C08F12/06 ,  C08F12/08 ,  C08F212/00 ,  G03F7/032 ,  C08C19/22 ,  C08F12/24

CPC分类号： C08F12/06

摘要： Resins for use in chemically amplified resists are represented by the general formula (I): ##STR1## wherein R.sub.1 is t-butyl or tetrahydropyranyl; R.sub.2 is hydrogen or methyl; n and m are integers; and the ratio n/((m+n) ranges from 0.1 to 0.9. Methods for manufacturing the resins comprise reacting a monomer represented by the formula (II): ##STR2## with a monomer represented by the formula (III): ##STR3## to form a copolymer represented by the formula (IV): ##STR4## wherein R.sub.1 and R.sub.2 are defined as above; and hydrolyzing acetoxy groups contained in the copolymer represented by the formula (IV) to form the resin compositions.

摘要翻译： 用于化学放大抗蚀剂的树脂由通式（I）表示：其中R 1是叔丁基或四氢吡喃基; R2是氢或甲基; n和m是整数; 并且n /（（m + n）的比率为0.1〜0.9。制造树脂的方法包括使由式（II）表示的单体：＆lt; IMAGE＆gt;与由式（III）表示的单体反应：＆lt; IMAGE 以形成由式（IV）表示的共聚物：其中R1和R2如上定义;和水解由式（IV）表示的共聚物中所含的乙酰氧基以形成树脂组合物。

公开(公告)号：US5593725A

公开(公告)日：1997-01-14

申请号：US304197

申请日：1994-09-12

申请人： Chun-geun Park ,  Gi-sung Yeo ,  Jung-chul Park

发明人： Chun-geun Park ,  Gi-sung Yeo ,  Jung-chul Park

IPC分类号： G03F7/11 ,  G03F7/09 ,  G03F7/40 ,  H01L21/027 ,  H01L21/312 ,  B05D5/00 ,  B05D5/06

CPC分类号： H01L21/0276 ,  G03F7/091 ,  Y10S438/952

摘要： A method for manufacturing an anti-reflective layer comprises the steps of coating a polymer solution containing at least one compound selected from the group consisting of phenol-based resins, water-soluble resins and acryl resins as a main component, and then baking at a high temperature. The method is simplified and the layer's reflectance is greatly enhanced.

摘要翻译： 制造抗反射层的方法包括以下步骤：将含有至少一种选自苯酚类树脂，水溶性树脂和丙烯酸树脂的化合物作为主要成分的聚合物溶液进行涂布，然后在 高温。 该方法简化，层反射率大大提高。

公开(公告)号：US06280903B1

公开(公告)日：2001-08-28

申请号：US09618142

申请日：2000-07-17

申请人： Yool Kang ,  Sang-Jun Choi ,  Dong-Won Jung ,  Chun-Geun Park ,  Young-Bum Koh

发明人： Yool Kang ,  Sang-Jun Choi ,  Dong-Won Jung ,  Chun-Geun Park ,  Young-Bum Koh

IPC分类号： G03C1492

CPC分类号： G03F7/039 ,  G03F7/0045

摘要： Copolymers and terpolymers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof. R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; M and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.

摘要翻译： 共聚物和三元共聚物用于化学增强抗蚀剂。 三元共聚物具有下式：其中R 3选自氢和C 1至C 10脂族烃，其中所述脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基 。 R 4选自氢和C 1至C 10脂族烃，其中所述脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基; R5选自氢和甲基; R6选自叔丁基和四氢吡喃基; M和n分别是整数; 并且其中n /（m + n）为约0.1至约0.5。

公开(公告)号：US6103845A

公开(公告)日：2000-08-15

申请号：US805212

申请日：1997-02-27

申请人： Sang-jun Choi ,  Chun-geun Park ,  Young-bum Koh

发明人： Sang-jun Choi ,  Chun-geun Park ,  Young-bum Koh

IPC分类号： C08F220/12 ,  C08F220/18 ,  C08F220/28 ,  C08F222/06 ,  C08F232/08 ,  C08G61/08 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： C08F220/18 ,  C08F222/06 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/111 ,  Y10S430/115

摘要： Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: ##STR1## wherein R.sub.3 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R.sub.4 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R.sub.5 is selected from the group consisting of hydrogen and methyl; R.sub.6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.

摘要翻译： 共聚物和三聚体用于化学增强抗蚀剂。 三元共聚物具有下式：其中R 3选自氢和C 1至C 10脂族烃，其中脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基 ; R4选自氢和C1至C10脂族烃，其中脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基; R5选自氢和甲基; R6选自叔丁基和四氢吡喃基; m和n分别为整数; 并且其中n /（m + n）为约0.1至约0.5。

公开(公告)号：US5981141A

公开(公告)日：1999-11-09

申请号：US942249

申请日：1997-10-01

申请人： Sang-jun Choi ,  Chun-geun Park ,  Hai-won Lee

发明人： Sang-jun Choi ,  Chun-geun Park ,  Hai-won Lee

IPC分类号： G03F7/004 ,  C08F30/08 ,  C08L43/04 ,  G03F7/039 ,  G03F7/075 ,  G03C1/72

CPC分类号： G03F7/0758 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111

摘要： In general, the invention provides polymers which may be used in chemically amplified resists. More particularly, the invention relates to esterified polymers containing the group: ##STR1## Resist compositions comprise the esterified polymers and photoacid generators.

公开(公告)号：US5847063A

公开(公告)日：1998-12-08

申请号：US843446

申请日：1997-04-16

申请人： Sang-jun Choi ,  Chun-geun Park

发明人： Sang-jun Choi ,  Chun-geun Park

IPC分类号： G03F7/039 ,  C08F4/04 ,  C08F12/06 ,  C08F12/08 ,  C08F212/00 ,  G03F7/032 ,  C08F20/10

CPC分类号： C08F12/06

摘要： Resins for use in chemically amplified resists are represented by the general formula (I): ##STR1## wherein R.sub.1 is t-butyl or tetrahydropyranyl; R.sub.2 is hydrogen or methyl; n and m are integers; and the ratio n/((m+n) ranges from 0.1 to 0.9. Methods for manufacturing the resins comprise reacting a monomer represented by the formula (II): ##STR2## with a monomer represented by the formula (III): ##STR3## to form a copolymer represented by the formula (IV): ##STR4## wherein R.sub.1 and R.sub.2 are defined as above; and hydrolyzing acetoxy groups contained in the copolymer represented by the formula (IV) to form the resin compositions.

公开(公告)号：US5733704A

公开(公告)日：1998-03-31

申请号：US705723

申请日：1996-08-30

申请人： Sang-jun Choi ,  Chun-geun Park

发明人： Sang-jun Choi ,  Chun-geun Park

IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC分类号： G03F7/0045 ,  G03F7/039 ,  Y10S430/106 ,  Y10S430/111

摘要： A resist composition by which high resolution patterns can be formed in a lithography process, due to its high sensitivity to light and large difference in solubilities in a developing solution before and after exposure to light, and which has excellent thermal characteristics. The resist composition is suitable for manufacturing highly integrated semiconductor chips.

摘要翻译： 由于其对光的高灵敏度和在曝光前后的显影液中的溶解度的大的差异，并且具有优异的热特性，因此可以在光刻工艺中形成高分辨率图案的抗蚀剂组合物。 抗蚀剂组合物适用于制造高度集成的半导体芯片。

公开(公告)号：US06713229B2

公开(公告)日：2004-03-30

申请号：US10153474

申请日：2002-05-21

申请人： Sang-jun Choi ,  Chun-geun Park ,  Young-bum Koh

发明人： Sang-jun Choi ,  Chun-geun Park ,  Young-bum Koh

IPC分类号： G03F7004

CPC分类号： C08F220/18 ,  C08F222/06 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/111 ,  Y10S430/115

摘要： Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.

摘要翻译： 共聚物和三聚体用于化学增强抗蚀剂。 三元共聚物具有下式：其中R 3选自氢和C 1至C 10脂族烃，其中脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基 ; R4选自氢和C1至C10脂族烃，其中脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基; R5选自氢和甲基; R6选自叔丁基和四氢吡喃基; m和n分别为整数; 并且其中n /（m + n）为约0.1至约0.5。

公开(公告)号：US5851727A

公开(公告)日：1998-12-22

申请号：US866807

申请日：1997-05-30

申请人： Sang-jun Choi ,  Chun-geun Park ,  Young-bum Koh

发明人： Sang-jun Choi ,  Chun-geun Park ,  Young-bum Koh

IPC分类号： C07C69/00 ,  C08F220/26 ,  C08F220/30 ,  G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

CPC分类号： C07C69/00 ,  C08F220/30 ,  G03F7/0045 ,  C07C2103/00 ,  Y10S430/111

摘要： Photosensitive polymers are represented by the formula: ##STR1## wherein R1 is selected from the group consisting of hydrogen and methyl; R2 is selected from the group consisting of aliphatic hydrocarbon groups having from 6 to 20 carbon atoms; R3 is selected from the group consisting of a t-butyl group and a tetrahydropyranyl group, and m and n are selected such that the ratio m/(n+m) ranges from 0.1 to 0.9. Photoresist compositions comprise the photosensitive polymers and photoacid generators.

摘要翻译： 光敏聚合物由下式表示：其中R 1选自氢和甲基; R2选自具有6至20个碳原子的脂族烃基; R3选自叔丁基和四氢吡喃基，并且选择m和n使得m /（n + m）的比例为0.1至0.9。 光致抗蚀剂组合物包含光敏聚合物和光致酸产生剂。