发明授权
US06418756B1 Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture
失效
使用来自气体和液体混合物的原料蒸汽的低流量制造平面波导的方法
- 专利标题： Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture
- 专利标题（中）： 使用来自气体和液体混合物的原料蒸汽的低流量制造平面波导的方法
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申请号： US09494092申请日： 2000-01-28
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公开(公告)号： US06418756B1公开(公告)日： 2002-07-16
- 发明人: Mark A. McDermott
- 申请人： Mark A. McDermott
- 主分类号： C03B804
- IPC分类号： C03B804
摘要：
The present invention provides a method for producing low flow rates of feedstock vapors used in the manufacture of silica glass. The method includes the steps of providing a constant flow of a liquid feedstock, mixing the flow of the liquid feedstock with an injector gas, expelling the mixture of liquid feedstock and inert gas from an injector orifice into a vaporizer chamber, flowing a carrier gas into the vaporizer chamber and through the mixture of liquid feedstock and injector gas, and vaporizing the liquid feedstock in the vaporizer chamber. The present invention is useful in the fabrication of planar silica waveguides.
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