利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

7 条记录 (耗时 0.012 秒)

    Dental porcelain
    3.
    发明授权
    Dental porcelain 失效
    牙科瓷器

    公开(公告)号：US06187701B1

    公开(公告)日：2001-02-13

    申请号：US09321551

    申请日：1999-05-28

    申请人： Masato Sekino ,  Hiroyuki Nakagawa ,  Osamu Iwamoto ,  Masaaki Ushioda

    发明人： Masato Sekino ,  Hiroyuki Nakagawa ,  Osamu Iwamoto ,  Masaaki Ushioda

    IPC分类号： C03B804

    CPC分类号： A61K6/0008 ,  A61K6/0017 ,  A61K6/0094 ,  A61K6/0205 ,  A61K6/0215

    摘要： Provided is a porcelain which is suitable as a dental porcelain capable of being fired on a ceramics core and has a low firing temperature and a low thermal expansion coefficient and which is excellent in a chemical durability. The above dental porcelain comprises glass containing silicon oxide, aluminum oxide, boron oxide, zinc oxide, sodium oxide and lithium oxide as principal components. The contents of these respective components in the above glass are 57 to 65% by weight of SiO2, 8 to 18% by weight of Al2O3, 15 to 25% by weight of B2O3, 0.1 to 2% by weight of ZnO, 3 to 7% by weight of Na2O and 2 to 8% by weight of Li2O respectively in terms of a percent by weight based on the total of the respective components when the respective components are reduced to SiO2, Al2O3, B2O3, ZnO, Na2O and Li2O respectively. The particularly preferred dental porcelain comprises glass having a thermal expansion coefficient of 6.0×10−6 (1/°C.) or less as a principal structural component.

    摘要翻译： 本发明提供一种适合作为能够在陶瓷芯上焙烧的牙科瓷，并且具有低烧成温度和低热膨胀系数并且化学耐久性优异的瓷器。 上述牙瓷包含含有氧化硅，氧化铝，氧化硼，氧化锌，氧化钠和氧化锂作为主要成分的玻璃。 上述玻璃中的各成分的含量为SiO 2为57〜65重量％，Al 2 O 3为8〜18重量％，B 2 O 3为15〜25重量％，ZnO为0.1〜2重量％，3〜7 相对于各成分分别还原为SiO 2，Al 2 O 3，B 2 O 3，ZnO，Na 2 O，Li 2 O时，各成分的总量，按重量百分比表示，分别为Na 2 O和2〜8重量％的Li 2 O。 特别优选的牙瓷包含热膨胀系数为6.0×10 -6（1 /℃）以下的玻璃作为主要结构成分。

    Particle deposition system and method
    4.
    发明授权
    Particle deposition system and method 有权
    颗粒沉积系统和方法

    公开(公告)号：US06789401B1

    公开(公告)日：2004-09-14

    申请号：US09894447

    申请日：2001-06-28

    申请人： Franklin W. Dabby ,  Bedros Orchanian

    发明人： Franklin W. Dabby ,  Bedros Orchanian

    IPC分类号： C03B804

    CPC分类号： C03B37/01486 ,  C03B37/01406 ,  C03B37/0142 ,  C03B2207/36 ,  C03B2207/66 ,  C03B2207/70 ,  C03B2207/80

    摘要： A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.

    摘要翻译： 一种用于将化学蒸气沉积到工件上的沉积系统，包括具有用于在工件上进行化学气相沉积的多个部件的沉积室。 沉积室包括由Hasteloy制成的内表皮，用于将多个部件和工件从围绕沉积系统的空气密封，外表皮包围内皮，并通过气隙与内皮隔开。 外皮包括在沉积室的内表皮和外表皮之间的气隙中产生对流的排气口。 沉积系统还具有用于调节进入沉积室的气体和蒸汽的流动的气体面板，以及用于控制气体面板和沉积室中的部件的操作的计算机。

    Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture
    5.
    发明授权
    Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture 失效
    使用来自气体和液体混合物的原料蒸汽的低流量制造平面波导的方法

    公开(公告)号：US06418756B1

    公开(公告)日：2002-07-16

    申请号：US09494092

    申请日：2000-01-28

    申请人： Mark A. McDermott

    发明人： Mark A. McDermott

    IPC分类号： C03B804

    CPC分类号： C03B37/01413 ,  C03B19/1415 ,  C03B2207/32 ,  C03B2207/34 ,  C03B2207/85

    摘要： The present invention provides a method for producing low flow rates of feedstock vapors used in the manufacture of silica glass. The method includes the steps of providing a constant flow of a liquid feedstock, mixing the flow of the liquid feedstock with an injector gas, expelling the mixture of liquid feedstock and inert gas from an injector orifice into a vaporizer chamber, flowing a carrier gas into the vaporizer chamber and through the mixture of liquid feedstock and injector gas, and vaporizing the liquid feedstock in the vaporizer chamber. The present invention is useful in the fabrication of planar silica waveguides.

    摘要翻译： 本发明提供一种生产用于制造石英玻璃的原料蒸汽的低流量的方法。 该方法包括以下步骤：提供液体原料的恒定流动，将液体原料的流动与喷射器气体混合，将来自喷射器孔的液体原料和惰性气体的混合物排出到蒸发器室中，将载气流入 蒸发器室并通过液体原料和喷射器气体的混合物，并蒸发蒸发器室中的液体原料。 本发明在平面二氧化硅波导的制造中是有用的。

    Manufacturing method of synthetic silica glass
    7.
    发明授权
    Manufacturing method of synthetic silica glass 有权
    合成石英玻璃的制造方法

    公开(公告)号：US06378340B2

    公开(公告)日：2002-04-30

    申请号：US09525231

    申请日：2000-03-14

    申请人： Seishi Fujiwara ,  Norio Komine ,  Hiroki Jinbo

    发明人： Seishi Fujiwara ,  Norio Komine ,  Hiroki Jinbo

    IPC分类号： C03B804

    CPC分类号： C03B19/1415 ,  C03B2207/32 ,  C03B2207/34

    摘要： A method of manufacturing synthetic silica glass includes the steps of pressurizing a liquid storage tank including a liquid silicon compound therein, generating bubbles in the liquid silicon compound using a foamer, removing the bubbles using a degassed, displacing the liquid silicon compound into a vaporizer while controlling an amount of the liquid silicon compound displaced by a liquid mass flow meter, mixing the displaced liquid silicon compound with a carrier gas to generate a gaseous silicon compound, injecting the gaseous silicon compound into a synthesis furnace, and forming synthetic silica glass by hydrolyzing the gaseous silicon compound in the synthesis furnace.

    摘要翻译： 制造合成石英玻璃的方法包括以下步骤：在其中加入包含液体硅化合物的储液罐，使用发泡剂在液态硅化合物中产生气泡，使用脱气，将液态硅化合物置换成蒸发器，除去气泡，同时 控制由液体质量流量计置换的液体硅化合物的量，将置换的液体硅化合物与载气混合以产生气态硅化合物，将气态硅化合物注入合成炉中，并通过水解形成合成二氧化硅玻璃 合成炉中的气态硅化合物。