发明授权
- 专利标题: Method for removing reactive metal from a reactor system
- 专利标题(中): 从反应器系统中除去活性金属的方法
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申请号: US08781434申请日: 1997-01-10
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公开(公告)号: US06419986B1公开(公告)日: 2002-07-16
- 发明人: Dennis L. Holtermann , Hong Chiu Chen , Richard M Wolpert , Charles R. Wilson , Daniel P. Hagewiesche
- 申请人: Dennis L. Holtermann , Hong Chiu Chen , Richard M Wolpert , Charles R. Wilson , Daniel P. Hagewiesche
- 主分类号: C23C1606
- IPC分类号: C23C1606
摘要:
A method of removing reactive metal from a metal-coated reactor system, comprising contacting at least a portion of a metal-coated reactor system containing reactive metal with a getter to produce movable metal, and fixating the movable metal, the getter, or both. The contacting is preferably done prior to catalyst loading. A preferred coating metal comprises tin and a preferred getter comprises HCl. The invention is also a method for reducing catalyst contamination from a metal which was used to coat a reactor system. The method comprises contacting a metal-coated reactor system, with a gaseous halogen-containing compound to produce movable metal; thereafter or simultaneously, at least a portion of the movable metal is removed from the reactor system. Then a halided catalyst is loaded into the reactor system.
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