发明授权
US06420090B1 Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same
失效
液体光固化性组合物,水性光固化性组合物及其抗蚀剂图案形成方法
- 专利标题: Liquid photocurable composition, water-based photocurable composition and resist pattern-forming method by use of the same
- 专利标题(中): 液体光固化性组合物,水性光固化性组合物及其抗蚀剂图案形成方法
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申请号: US09453504申请日: 1999-12-03
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公开(公告)号: US06420090B1公开(公告)日: 2002-07-16
- 发明人: Daisuke Kojima , Genji Imai , Jun Akui , Hideo Kogure , Osamu Isozaki
- 申请人: Daisuke Kojima , Genji Imai , Jun Akui , Hideo Kogure , Osamu Isozaki
- 优先权: JP10-345047 19981204
- 主分类号: G03F7037
- IPC分类号: G03F7037
摘要:
A liquid photocurable composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other, and optionally containing a photopolymerizable compound other than the photopolymerizable polyurethane compound.
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