• 专利标题: Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same
  • 申请号: US09513308
    申请日: 2000-02-25
  • 公开(公告)号: US06429090B1
    公开(公告)日: 2002-08-06
  • 发明人: Tomoharu FujiwaraNoriyuki Hirayanagi
  • 申请人: Tomoharu FujiwaraNoriyuki Hirayanagi
  • 优先权: JP11-055367 19990303; JP11-155192 19990602
  • 主分类号: H01L2176
  • IPC分类号: H01L2176
Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same
摘要:
Fiducial mark bodies are provided for use in CPB microlithography apparatus and methods. Such bodies are especially useful for attachment to the wafer stage of such apparatus, for measuring a distance between a reference position of the CPB-optical system of the apparatus and a reference position of an optical-based alignment sensor of the apparatus. The mark bodies provide improved accuracy of these and other positional measurements. A typical mark body is made of a substrate plate (e.g., quartz or quartz-ceramic) having a low coefficient of thermal expansion. Mark elements are defined on the substrate plate by a layer of heavy metal (e.g. are Ta, W, or Pt). The mark body includes a surficial or interior layer of an electrically conductive light metal that prevents electrostatic charging of the mark body and can be connected to ground.
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