发明授权
- 专利标题: Diacetylenics containing adjacent triple bonds
- 专利标题(中): 含有相邻三键的二乙酰基
-
申请号: US09845106申请日: 2001-04-27
-
公开(公告)号: US06440056B1公开(公告)日: 2002-08-27
- 发明人: Alok Singh , Paul Schoen , Dan Zabetakis , Joel M. Schnur
- 申请人: Alok Singh , Paul Schoen , Dan Zabetakis , Joel M. Schnur
- 主分类号: C11B300
- IPC分类号: C11B300
摘要:
This invention pertains to a process for preparing diacetylenics, to diacetylenic compounds and to reduced diacetylenic compounds. The process includes the steps of reacting coupling an acetylenic acid in presence of cupric chloride in Ethylamine and hydroxylamine hydrochloride to form a diacetylenic diacid; reacting the diacetylenic diacid with a lithium compound, trimethylsilyl chloride and hydrochloric acid to form a diacetylenic compound; and reducing the diacetylenic compound to a reduced diacetylenic compound. The diacetylenic compounds have the formula COOH—(CH2)m—C≡C—C≡C—(CH2)m—C(═O)—R or R—C(═O)—(CH2)m—C≡C—C≡C—(CH2)m—C(═O)—R and the reduced cyclic diacetylenic compounds have the formula COOH—(CH2)m—C≡C—C≡C—(CH2)m—CH2—R or R—CH2—(CH2)m—C≡C—C≡C—(CH2)m—CH2—R, where m is 1-18 and R is selected from alkyl groups of 1-10 and cyclic groups containing 6-35 carbon atoms and aryl moieties
信息查询