发明授权
- 专利标题: Method of depositing multilayer thin films
- 专利标题(中): 沉积多层薄膜的方法
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申请号: US09603408申请日: 2000-06-26
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公开(公告)号: US06447839B1公开(公告)日: 2002-09-10
- 发明人: Hari Hegde , Adrian Devasahayam , Jinsong Wang
- 申请人: Hari Hegde , Adrian Devasahayam , Jinsong Wang
- 主分类号: B05D512
- IPC分类号: B05D512
摘要:
This invention is directed to methods for depositing multilayered thin films onto substrates, for example in making thin film magnetic heads. In accordance with the invention a first film, such as Cr, is deposited onto the substrate at a first pressure and a second layer, such as CoCrPt is deposited at a second pressure.
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