发明授权
US06451490B1 Method to overcome image shortening by use of sub-resolution reticle features 失效
通过使用分辨率分辨率特征克服图像缩短的方法

Method to overcome image shortening by use of sub-resolution reticle features
摘要:
Image shortening in a photolithographic process is substantially reduced by using sub-resolution reticle features to alter the aerial image in the shortened regions. The use of such sub-resolution reticle features is simple to implement in a design system, and allows for increased feature aspect ratio as well as overlap to other critical features.
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