发明授权
- 专利标题： Polishing composition
- 专利标题（中）： 抛光组成
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申请号： US09772906申请日： 2001-01-31
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公开(公告)号： US06454820B2公开(公告)日： 2002-09-24
- 发明人: Toshiya Hagihara , Koichi Naito , Shigeo Fujii
- 申请人： Toshiya Hagihara , Koichi Naito , Shigeo Fujii
- 优先权： JP2000-026784 20000203
- 主分类号： C09K314
- IPC分类号： C09K314
摘要：
A polishing composition comprising silica particles, water, and Fe salt and/or Al salt of a polyaminocarboxylic acid; a polishing process comprising applying the polishing composition; a process for manufacturing a magnetic disk substrate, comprising the step of polishing a substrate with the polishing composition; a magnetic disk substrate manufactured by applying the polishing composition.
公开/授权文献
- US20010017007A1 Polishing composition 公开/授权日：2001-08-30