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14 条记录 (耗时 0.015 秒)

    POLISHING FLUID COMPOSITION
    1.
    发明申请
    POLISHING FLUID COMPOSITION 有权
    抛光液组合物

    公开(公告)号：US20090197415A1

    公开(公告)日：2009-08-06

    申请号：US12415548

    申请日：2009-03-31

    申请人： Shigeo FUJII ,  Yoshiaki Oshima ,  Koichi Naito

    发明人： Shigeo FUJII ,  Yoshiaki Oshima ,  Koichi Naito

    IPC分类号： H01L21/304

    CPC分类号： C09G1/02 ,  B24B37/044

    摘要： To provide a polishing composition capable of increasing polishing rate and reducing surface roughness, without causing surface defects on a surface of an object to be polished; and a polishing process for a substrate to be polished. [1] a polishing composition comprising water, an abrasive, an intermediate alumina, and a polycarboxylic acid having 4 or more carbon atoms with no OH groups or a salt thereof, wherein a content of the intermediate alumina is from 1 to 90 parts by weight, based on 100 parts by weight of the abrasive; and [2] a polishing process for a substrate to be polished, comprising polishing a substrate to be polished under conditions that a composition of a polishing liquid during polishing is the composition as defined in item [1] above.

    摘要翻译： 提供能够提高抛光速度并降低表面粗糙度的抛光组合物，而不会在被抛光物体的表面上引起表面缺陷; 以及用于待抛光的基底的抛光工艺。 [1]一种抛光组合物，其包含水，研磨剂，中间体氧化铝和具有4个以上没有OH基团的碳原子的多元羧酸或其盐，其中所述中间体氧化铝的含量为1〜90重量份 ，基于100重量份的研磨剂; 以及[2]一种抛光用基材的研磨方法，其特征在于，在抛光中的研磨液的成分为上述[1]所述的组成的条件下，研磨抛光用基板。

    Polishing composition
    3.
    发明授权
    Polishing composition 有权
    抛光组成

    公开(公告)号：US06454820B2

    公开(公告)日：2002-09-24

    申请号：US09772906

    申请日：2001-01-31

    申请人： Toshiya Hagihara ,  Koichi Naito ,  Shigeo Fujii

    发明人： Toshiya Hagihara ,  Koichi Naito ,  Shigeo Fujii

    IPC分类号： C09K314

    CPC分类号： G11B23/505 ,  B24B37/044 ,  C09G1/02 ,  G11B5/8404

    摘要： A polishing composition comprising silica particles, water, and Fe salt and/or Al salt of a polyaminocarboxylic acid; a polishing process comprising applying the polishing composition; a process for manufacturing a magnetic disk substrate, comprising the step of polishing a substrate with the polishing composition; a magnetic disk substrate manufactured by applying the polishing composition.

    摘要翻译： 一种抛光组合物，其包含二氧化硅颗粒，水，以及聚氨基羧酸的Fe盐和/或Al盐; 抛光工艺，包括施加抛光组合物; 一种制造磁盘基片的方法，包括用抛光组合物抛光基片的步骤; 通过应用抛光组合物制造的磁盘基片。

    Polishing fluid composition
    5.
    发明授权
    Polishing fluid composition 有权
    抛光液组成

    公开(公告)号：US07955517B2

    公开(公告)日：2011-06-07

    申请号：US12415548

    申请日：2009-03-31

    申请人： Shigeo Fujii ,  Yoshiaki Oshima ,  Koichi Naito

    发明人： Shigeo Fujii ,  Yoshiaki Oshima ,  Koichi Naito

    IPC分类号： C03C15/00 ,  B44C1/22 ,  H01L21/302

    CPC分类号： C09G1/02 ,  B24B37/044

    摘要： To provide a polishing composition capable of increasing polishing rate and reducing surface roughness, without causing surface defects on a surface of an object to be polished; and a polishing process for a substrate to be polished. [1] a polishing composition comprising water, an abrasive, an intermediate alumina, and a polycarboxylic acid having 4 or more carbon atoms with no OH groups or a salt thereof, wherein a content of the intermediate alumina is from 1 to 90 parts by weight, based on 100 parts by weight of the abrasive; and [2] a polishing process for a substrate to be polished, comprising polishing a substrate to be polished under conditions that a composition of a polishing liquid during polishing is the composition as defined in item [1] above.

    摘要翻译： 提供能够提高抛光速度并降低表面粗糙度的抛光组合物，而不会在被抛光物体的表面上引起表面缺陷; 以及用于待抛光的基底的抛光工艺。 [1]一种抛光组合物，其包含水，研磨剂，中间体氧化铝和具有4个以上没有OH基团的碳原子的多元羧酸或其盐，其中所述中间体氧化铝的含量为1〜90重量份 ，基于100重量份的研磨剂; 以及[2]一种抛光用基材的研磨方法，其特征在于，在抛光中的研磨液的成分为上述[1]所述的组成的条件下，研磨抛光用基板。

    Ultrasonic wave linear motor
    8.
    发明授权
    Ultrasonic wave linear motor 失效
    超声波线性电机

    公开(公告)号：US5216313A

    公开(公告)日：1993-06-01

    申请号：US639396

    申请日：1991-01-10

    申请人： Kazumasa Ohinishi ,  Koichi Naito ,  Toru Nakazawa

    发明人： Kazumasa Ohinishi ,  Koichi Naito ,  Toru Nakazawa

    IPC分类号： H01L41/09 ,  H02N2/08

    CPC分类号： H01L41/0906 ,  H02N2/003 ,  H02N2/026

    摘要： The present invention proposes an ultrasonic wave linear motor constituted in such a way that an oscillatory element for making oscillation in a direction crossing the shaft line of an oscillatory member is attached to the oscillatory member made of an elastic body formed in a rod shape and a driven body capable of making free relative movement in a direction crossing the shaft line in relation to the above oscillatory member is arranged to abut the end of the above oscillatory member, and also proposes such a driving process that, the ultrasonic wave linear motor makes linear movement by exciting flexural oscillation and longitudinal oscillation on the above oscillatory member by means of the oscillation of an oscillatory element so that an elliptical oscillation composed of flexural oscillation and longitudinal oscillation may take place on the surface of the oscillatory member in contact with the driven body. The present invention also proposes a process for driving the oscillation frequency of the oscillatory element by means of the resonance frequency of the oscillatory member as the most efficient driving process in view of energy.

    摘要翻译： 本发明提出一种超声波线性电动机，其特征在于，在与振动部件的轴线交叉的方向上振荡的振动元件安装在由杆状的弹性体构成的振荡部件上， 被驱动体能够相对于上述振动部件在与轴线相交的方向上进行自由的相对移动而被配置成抵靠上述振动部件的端部，并且还提出了这样一种驱动过程，使得超声波线性电动机成为线性 通过振荡元件的振荡激励上述振荡元件上的弯曲振荡和纵向振荡的运动，使得在与驱动体接触的振荡元件的表面上可能发生由弯曲振荡和纵向振荡组成的椭圆振荡 。 本发明还提出了一种通过振荡元件的谐振频率来考虑能量来驱动振荡元件的振荡频率作为最有效驱动过程的方法。

    X-Y stage with ultrasonic actuator
    9.
    发明授权
    X-Y stage with ultrasonic actuator 失效
    超声波执行机构的X-Y平台

    公开(公告)号：US5013958A

    公开(公告)日：1991-05-07

    申请号：US423480

    申请日：1989-10-17

    申请人： Kazumasa Ohnishi ,  Koichi Naito ,  Toru Nakazawa

    发明人： Kazumasa Ohnishi ,  Koichi Naito ,  Toru Nakazawa

    IPC分类号： B23Q1/00 ,  B23Q1/34 ,  B23Q1/44 ,  B23Q1/62 ,  H01L41/09 ,  H02N2/00

    CPC分类号： H02N2/028 ,  H02N2/001 ,  H02N2/026

    摘要： An X-Y stage including a fixed plate, a moving plate adapted to linearly reciprocatively move relative to the fixed plate, and an ultrasonic linear motor provided on either the fixed plate or the moving plate. The ultrasonic linear motor is provided with at lest two leg portions oriented in a direction perpendicular to a moving direction of the moving plate, a body portion for connecting base ends of the leg portions, and vibration sources for vibrating the leg portions and the body portion. The leg portions have free ends pressed against the other of the fixed plate on which the motor is not provided and the moving plate.

    摘要翻译： X-Y平台包括固定板，适于相对于固定板线性往复移动的移动板，以及设置在固定板或移动板上的超声波线性马达。 超声波线性电动机设置有至少两个腿部部分，该两个腿部部分沿垂直于移动板的移动方向的方向定向，用于连接腿部的基端的主体部分和用于使腿部和主体部分振动的振动源 。 脚部具有压靠在未设置电动机的固定板中的另一个上的自由端和移动板。