发明授权
- 专利标题: Production of short fiber silica
- 专利标题(中): 生产短纤维二氧化硅
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申请号: US09560984申请日: 2000-04-28
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公开(公告)号: US06455154B1公开(公告)日: 2002-09-24
- 发明人: Akira Nakashima , Kazuaki Inoue , Ryo Muraguchi , Michio Komatsu
- 申请人: Akira Nakashima , Kazuaki Inoue , Ryo Muraguchi , Michio Komatsu
- 优先权: JP9-225659 19970807
- 主分类号: D02G300
- IPC分类号: D02G300
摘要:
A coating liquid for forming porous silica coating, comprising a product of reaction between a short fiber silica and a hydrolyzate of an alkoxysilane of the formula XnSi(OR)4-n or a halogenated silane of the formula XnSiX′4-n (in the formula, X represents a hydrogen atom, a fluorine atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, an aryl group or a vinyl group; X′ represents a chlorine atom or a bromine atom; and n is an integer of 0 to 3). A coated substrate comprising a porous silica coating film formed from the above coating liquid for forming porous silica coating. A short fiber silica having an average diameter (D) of 10 to 30 nm, a length (L) of 30 to 100 nm and an aspect ratio (L/D) of 3 to 10. The above coating liquid for forming porous silica coating enables forming an insulating film which is excellent in adherence to a substrate surface, mechanical strength, chemical resistance and crack resistance and enables flattening irregularities of a substrate surface to a high degree. The coating film of the coated substrate has the above excellent properties.