发明授权
- 专利标题: Self-aligned interconnect and method for producing same
- 专利标题(中): 自对准互连及其制造方法
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申请号: US09843833申请日: 2001-04-30
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公开(公告)号: US06457811B1公开(公告)日: 2002-10-01
- 发明人: Alfred I-Tsung Pan , Terry M. Lambright
- 申请人: Alfred I-Tsung Pan , Terry M. Lambright
- 主分类号: B41J214
- IPC分类号: B41J214
摘要:
A self-aligned interconnect significantly reduces manufacturing costs and provides important advantages in a number of specific applications begins with a single crystal substrate. The substrate is machined to accept microelectronic chips at various locations (openings) along the substrate. Corresponding chips are constructed to precisely fit the openings in the crystal substrate. To ensure precision fit, both the substrate and the chip are etched along the same crystal plane. As a result, the chips can be placed in the openings in the substrate with perfect or nearly perfect alignment in the x and y directions without expensive alignment tools. In effect, the chips and the substrate are self aligned.
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