发明授权
US06458426B1 Method for depositing a patterned layer of material over a substrate 有权
在衬底上沉积图案化材料层的方法

  • 专利标题: Method for depositing a patterned layer of material over a substrate
  • 专利标题(中): 在衬底上沉积图案化材料层的方法
  • 申请号: US09717351
    申请日: 2000-11-22
  • 公开(公告)号: US06458426B1
    公开(公告)日: 2002-10-01
  • 发明人: Vladimir BulovicStephen R. Forrest
  • 申请人: Vladimir BulovicStephen R. Forrest
  • 主分类号: B05D128
  • IPC分类号: B05D128
Method for depositing a patterned layer of material over a substrate
摘要:
This application relates to a method of depositing a patterned layer of material, such as organic material, over a substrate or organizing materials over a substrate. The method involves using a stamp having at least one conductive pathway and an insulating layer to transfer material from a solution to a substrate in a specified pattern. The stamp may be used multiple times to transfer a similar pattern of organic material to multiple substrates or to different portions of the same substrate. The transferred material may then be preferably used as a photolithographic mask for nano-patterning the substrate. This application also relates to a stamp that may be used in depositing a patterned layer of material onto a substrate, a method of forming such a stamp, and a method of depositing a layer of oriented molecules over a substrate.
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