发明授权
- 专利标题: Method for depositing a patterned layer of material over a substrate
- 专利标题(中): 在衬底上沉积图案化材料层的方法
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申请号: US09717351申请日: 2000-11-22
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公开(公告)号: US06458426B1公开(公告)日: 2002-10-01
- 发明人: Vladimir Bulovic , Stephen R. Forrest
- 申请人: Vladimir Bulovic , Stephen R. Forrest
- 主分类号: B05D128
- IPC分类号: B05D128
摘要:
This application relates to a method of depositing a patterned layer of material, such as organic material, over a substrate or organizing materials over a substrate. The method involves using a stamp having at least one conductive pathway and an insulating layer to transfer material from a solution to a substrate in a specified pattern. The stamp may be used multiple times to transfer a similar pattern of organic material to multiple substrates or to different portions of the same substrate. The transferred material may then be preferably used as a photolithographic mask for nano-patterning the substrate. This application also relates to a stamp that may be used in depositing a patterned layer of material onto a substrate, a method of forming such a stamp, and a method of depositing a layer of oriented molecules over a substrate.
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