Invention Grant
- Patent Title: Simplified fabrication method of toroidal charged particle deflector vanes
- Patent Title (中): 环形带电粒子偏转叶片的简化制造方法
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Application No.: US09471613Application Date: 1999-12-23
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Publication No.: US06461680B2Publication Date: 2002-10-08
- Inventor: David J. Pinckney
- Applicant: David J. Pinckney
- Main IPC: B05D302
- IPC: B05D302

Abstract:
The present invention relates to a method and apparatus of fabricating electromagnetic coil vanes. The method involves photolithographically exposing high resolution, dense wire patterns in a flash coat of copper, on both sides of a ceramic vane substrate. The substrate can be pre-drilled with a through hole to connect the two copper coil patterns. Additional copper is then deposited on both high resolution patterns and in the through hole by plating until the desired thickness is obtained. A firing operation is then performed that eutectically bonds the copper to the ceramic.
Public/Granted literature
- US20010052467A1 SIMPLIFIED FABRICATION METHOD OF TOROIDAL CHARGED PARTICLE DEFLECTOR VANES Public/Granted day:2001-12-20
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