发明授权
US06465799B1 UV radiation system having materials for selectively attenuating radiation
有权
UV辐射系统具有用于选择性衰减辐射的材料
- 专利标题: UV radiation system having materials for selectively attenuating radiation
- 专利标题(中): UV辐射系统具有用于选择性衰减辐射的材料
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申请号: US09515190申请日: 2000-02-29
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公开(公告)号: US06465799B1公开(公告)日: 2002-10-15
- 发明人: Allan W. Kimble , John B. Enns , James A. Ebel
- 申请人: Allan W. Kimble , John B. Enns , James A. Ebel
- 主分类号: A61L1226
- IPC分类号: A61L1226
摘要:
This invention provides a high energy radiation system which produces UV radiation comprising a selectively attenuating material which increases the ratio of desired to undesired radiation to reduce the radiation damage to a target by selectively attenuating at least 30 percent of the radiation from greater than 200 up to 240 nm which impinges upon said attenuating material, and directs greater than 50 percent of the radiation from 240 nm to 280 nm which impinges upon said attenuating material.
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