发明授权
- 专利标题： Supervisory method for determining optimal process targets based on product performance in microelectronic fabrication
- 专利标题（中）： 基于微电子制造中的产品性能确定最佳过程目标的监督方法
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申请号： US09477464申请日： 2000-01-04
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公开(公告)号： US06470230B1公开(公告)日： 2002-10-22
- 发明人: Anthony J. Toprac , Michael L. Miller , Thomas Sonderman
- 申请人： Anthony J. Toprac , Michael L. Miller , Thomas Sonderman
- 主分类号： G06F1900
- IPC分类号： G06F1900
摘要：
A method is provided. for manufacturing, the method including processing a workpiece in a processing step, measuring a parameter characteristic of the processing performed on the workpiece in the processing step, and forming an output signal corresponding to the characteristic parameter measured. The method also includes setting a target value for the processing performed in the processing step based on the output signal.
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