发明授权
- 专利标题: Chemically amplified resist composition
- 专利标题(中): 化学放大抗蚀剂组合物
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申请号: US09445345申请日: 2000-04-03
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公开(公告)号: US06479210B2公开(公告)日: 2002-11-12
- 发明人: Yoshiaki Kinoshita , Satoru Funato , Yuko Yamaguchi
- 申请人: Yoshiaki Kinoshita , Satoru Funato , Yuko Yamaguchi
- 优先权: JP10-95680 19980408
- 主分类号: G03F7004
- IPC分类号: G03F7004
摘要:
A chemically amplified resist composition is disclosed which shows a high sensitivity, high resolution, excellent processing adaptability and excellent processing stability, which can form good pattern profile and which is suited as a finely processable material for use in manufacturing integrated circuit elements or the like. The chemically amplified resist composition comprises at least (a) an organic material containing a substituent or substituents capable of being released in the presence of an acid and (b) compounds capable of generating an acid upon exposure to radiation (acid-generators), composed of at least one onium salt and at least one of sulfone compounds and sulfonate compounds. This chemically amplified resist composition preferably further contains a basic compound.
公开/授权文献
- US20010036589A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION 公开/授权日:2001-11-01