发明授权
- 专利标题: Method of preparing a compound semiconductor crystal
- 专利标题(中): 化合物半导体晶体的制备方法
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申请号: US09765557申请日: 2001-01-19
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公开(公告)号: US06485563B2公开(公告)日: 2002-11-26
- 发明人: Tomohiro Kawase , Shinichi Sawada , Masami Tatsumi
- 申请人: Tomohiro Kawase , Shinichi Sawada , Masami Tatsumi
- 优先权: JP10-077309 19980325
- 主分类号: C30B900
- IPC分类号: C30B900
摘要:
A method of preparing a compound semiconductor crystal is able to dope the crystal with carbon with high reproducibility. The method includes the steps of sealing a carbon oxide gas of a predetermined partial pressure and a compound semiconductor material in a gas-impermeable airtight vessel, increasing the temperature of the vessel to melt the compound semiconductor material sealed in the vessel, and then decreasing the temperature of the vessel to solidify the melted compound semiconductor material to grow a compound semiconductor crystal containing a predetermined amount of carbon. With this method, a compound semiconductor crystal with a carbon concentration of 0.1×1015cm−3 to 20×1015cm−3 is prepared with high reproducibility.
公开/授权文献
- US20010006040A1 Method of preparing a compound semiconductor crystal 公开/授权日:2001-07-05
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