发明授权
US06486021B2 Method for manufacturing a semiconductor device having incorporated therein a high K capacitor dielectric 有权
制造具有高K电容电介质的半导体器件的方法

  • 专利标题: Method for manufacturing a semiconductor device having incorporated therein a high K capacitor dielectric
  • 专利标题(中): 制造具有高K电容电介质的半导体器件的方法
  • 申请号: US09727584
    申请日: 2000-12-04
  • 公开(公告)号: US06486021B2
    公开(公告)日: 2002-11-26
  • 发明人: Min-Soo KimChan Lim
  • 申请人: Min-Soo KimChan Lim
  • 优先权: KR99-60534 19991222
  • 主分类号: H01L218242
  • IPC分类号: H01L218242
Method for manufacturing a semiconductor device having incorporated therein a high K capacitor dielectric
摘要:
A semiconductor device for use in a memory cell includes an active matrix an active matrix provided with a semiconductor substrate, a plurality of transistors formed on the semiconductor substrate and conductive plugs electrically connected to the transistors, a number of lower electrodes formed on top of the conductive plugs, Ta2O5 films formed on the lower electrodes, composite films formed on the Ta2O5 films and upper electrodes formed on the composite films.
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