发明授权
- 专利标题: Apparatus and method for evaluating a semiconductor wafer
- 专利标题(中): 用于评估半导体晶片的装置和方法
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申请号: US09544280申请日: 2000-04-06
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公开(公告)号: US06489801B1公开(公告)日: 2002-12-03
- 发明人: Peter G. Borden , Regina G. Nijmeijer , Jiping Li
- 申请人: Peter G. Borden , Regina G. Nijmeijer , Jiping Li
- 主分类号: G01R3126
- IPC分类号: G01R3126
摘要:
An apparatus and method uses diffusive modulation (without generating a wave of carriers) for measuring a material property (such as any one or more of: mobility, doping, and lifetime) that is used in evaluating a semiconductor wafer. The measurements are carried out in a small area, for use on wafers having patterns for integrated circuit dice. The measurements are based on measurement of reflectance, for example as a function of carrier concentration. In one implementation, the semiconductor wafer is illuminated with two beams, one with photon energy above the bandgap energy of the semiconductor, and another with photon energy near or below the bandgap. The diameters of the two beams relative to one another are varied to extract additional information about the semiconductor material, for use in measuring, e.g. lifetime.
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