发明授权
US06490993B2 Rotating device for plasma immersion supported treatment of substrates
失效
用于等离子体浸渍的旋转装置支持基底处理
- 专利标题: Rotating device for plasma immersion supported treatment of substrates
- 专利标题(中): 用于等离子体浸渍的旋转装置支持基底处理
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申请号: US09341763申请日: 1999-09-09
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公开(公告)号: US06490993B2公开(公告)日: 2002-12-10
- 发明人: Ronald Neidhardt , Jeanne Forget , Karl Kohlhof , Siegmar Schoser
- 申请人: Ronald Neidhardt , Jeanne Forget , Karl Kohlhof , Siegmar Schoser
- 优先权: DE19750909 19971117
- 主分类号: C23C16509
- IPC分类号: C23C16509
摘要:
A rotary drive which is suitable in treatment of three-dimensional workpieces. In this rotary apparatus, only the removably mounted rotatable rods that serve as sample holders are connected to high voltage, which is delivered via a central high-voltage lead-in at the lower end of the rods, while the actual drive elements for rotating the rods are electrically insulated therefrom by suitable ceramic insulating elements.
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