Rotating device for plasma immersion supported treatment of substrates
    1.
    发明授权
    Rotating device for plasma immersion supported treatment of substrates 失效
    用于等离子体浸渍的旋转装置支持基底处理

    公开(公告)号:US06490993B2

    公开(公告)日:2002-12-10

    申请号:US09341763

    申请日:1999-09-09

    IPC分类号: C23C16509

    摘要: A rotary drive which is suitable in treatment of three-dimensional workpieces. In this rotary apparatus, only the removably mounted rotatable rods that serve as sample holders are connected to high voltage, which is delivered via a central high-voltage lead-in at the lower end of the rods, while the actual drive elements for rotating the rods are electrically insulated therefrom by suitable ceramic insulating elements.

    摘要翻译: 适用于三维工件的旋转驱动。 在这种旋转装置中,仅用作样品保持器的可移除安装的可旋转杆连接到高压,高压通过杆的下端的中心高压引入而传递,而用于旋转 棒通过合适的陶瓷绝缘元件与其电绝缘。