发明授权
US06504756B2 Dual floating gate programmable read only memory cell structure and method for its fabrication and operation 有权
双浮栅可编程只读存储单元结构及其制造和操作方法

  • 专利标题: Dual floating gate programmable read only memory cell structure and method for its fabrication and operation
  • 专利标题(中): 双浮栅可编程只读存储单元结构及其制造和操作方法
  • 申请号: US09808158
    申请日: 2001-03-15
  • 公开(公告)号: US06504756B2
    公开(公告)日: 2003-01-07
  • 发明人: Fernando GonzalezFrancis L. Bensistant
  • 申请人: Fernando GonzalezFrancis L. Bensistant
  • 主分类号: G11C1604
  • IPC分类号: G11C1604
Dual floating gate programmable read only memory cell structure and method for its fabrication and operation
摘要:
A flash memory cell in the form of a transistor capable of storing multi-bit binary data is disclosed. A pair of floating gates are provided beneath a control gate. The control gate is connected to a word line while active doped regions (source and drain regions) are connected to respective digit lines. The floating gates are separately charged and read out by controlling voltages applied to the word line and digit lines. The read out charges are decoded into a multi-bit binary value. One or both of the floating gates has a side insulator which connects through a conductor to an associated active doped region thereby forming a capacitor across the side insulator between the floating gate. This capacitor and active region facilitates operation of the transistor as a flash memory cell. Methods of fabricating the memory cell and operating it are also disclosed.
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