发明授权
US06509954B1 Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method
失效
具有由圆形ARC限定的中心孔径区域和具有减小的宽度的周边区域的孔径光阑以及曝光装置和方法
- 专利标题： Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method
- 专利标题（中）： 具有由圆形ARC限定的中心孔径区域和具有减小的宽度的周边区域的孔径光阑以及曝光装置和方法
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申请号： US09722515申请日： 2000-11-28
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公开(公告)号： US06509954B1公开(公告)日： 2003-01-21
- 发明人: Masashi Tanaka , Masato Kumazawa , Kinya Kato
- 申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato
- 优先权： JP5-161588 19930630; JP5-345619 19931222; JP6-116800 19940530; JP6-123762 19940606; JP6-141326 19940623; JP6-177898 19940729; JP6-200494 19940825
- 主分类号： G03B2742
- IPC分类号： G03B2742
摘要：
An aperture stop that can be used in an exposure apparatus and method includes a central aperture region defined by a circular arc and a peripheral region having a decreased width.
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