公开(公告)号：US07372544B2

公开(公告)日：2008-05-13

申请号：US11797605

申请日：2007-05-04

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/44 ,  G03B27/54

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

摘要翻译： 曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场 元素。 所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体 辐射图。 多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

公开(公告)号：US20070216885A1

公开(公告)日：2007-09-20

申请号：US11797605

申请日：2007-05-04

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/32

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

摘要翻译： 曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场 元素。 所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体 辐射图。 多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

公开(公告)号：US07372543B2

公开(公告)日：2008-05-13

申请号：US11471658

申请日：2006-06-21

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/32 ,  G03B27/54 ,  G03B27/44

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

公开(公告)号：US06795169B2

公开(公告)日：2004-09-21

申请号：US10382874

申请日：2003-03-07

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B2742

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.

摘要翻译： 一种具有多个投影光学系统的曝光装置，其中每个投影光学系统将预定图案投影到基板上并在基板上形成曝光场。 曝光装置还包括保持基板并沿至少沿直线延伸的扫描方向移动的基板台。 多个曝光区域沿着与扫描方向交叉的方向排列，并且投影光学系统和基板沿着扫描方向在图案投影操作期间相对移动。

公开(公告)号：US20080192216A1

公开(公告)日：2008-08-14

申请号：US12078863

申请日：2008-04-07

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/44

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An apparatus includes a plurality of projection optical systems, each including optical elements arranged in an optical path between a first plane and a second plane and forming a radiation pattern from the first plane onto an exposure field on the second plane via the optical elements. A movable portion is disposed in the side of the second plane with respect to the projection optical systems, which holds an object to be moved relative to the exposure field in a first direction in the second plane during scanning exposure of the object in which the radiation patterns are formed on the object as the object is moved in the first direction. The projection optical systems may include an adjustable wedge prism. The projection optical systems may include first and second optical units, optical axes of the first and second optical units being decentered from each other.

摘要翻译： 一种装置包括多个投影光学系统，每个投影光学系统包括布置在第一平面和第二平面之间的光路中的光学元件，并且通过光学元件将第一平面的辐射图形形成在第二平面上的曝光场上。 可移动部分相对于投影光学系统设置在第二平面的侧面，该投影光学系统在扫描曝光期间在第二平面中沿第一方向相对于曝光场移动物体，其中辐射 当物体沿第一方向移动时，在物体上形成图案。 投影光学系统可以包括可调楔形棱镜。 投影光学系统可以包括第一和第二光学单元，第一和第二光学单元的光轴彼此偏心。

公开(公告)号：US07023527B2

公开(公告)日：2006-04-04

申请号：US10920294

申请日：2004-08-18

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/42 ,  G03B27/44 ,  G03B27/54

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optically connected to a light source, and a projection optical system arranged in an optical path between the mask and the substrate. The illumination optical system illuminates the mask with linearly polarized light whose polarization direction extends along one of the scanning direction and a direction perpendicular to the scanning direction, without losses in quantity of light. The illumination optical system of the scanning projection exposure apparatus also can include a wave plate which is rotatable about a traveling direction of the light.

摘要翻译： 扫描投影曝光装置在沿着扫描方向移动感光基板的同时将掩模的图案转印到感光基板上。 扫描投影曝光装置可以包括光学连接到光源的照明光学系统和布置在掩模和基板之间的光路中的投影光学系统。 照明光学系统以偏振方向沿着扫描方向和与扫描方向垂直的方向延伸的线偏振光照射掩模，而不损失光量。 扫描投影曝光装置的照明光学系统也可以包括能够围绕光的行进方向旋转的波片。

公开(公告)号：US20050012917A1

公开(公告)日：2005-01-20

申请号：US10920294

申请日：2004-08-18

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G02B13/22 ,  G02B17/00 ,  G02B17/06 ,  G02B17/08 ,  G02B27/10 ,  G03F7/20 ,  G03B27/54

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optically connected to a light source, and a projection optical system arranged in an optical path between the mask and the substrate. The illumination optical system illuminates the mask with linearly polarized light whose polarization direction extends along one of the scanning direction and a direction perpendicular to the scanning direction, without losses in quantity of light. The illumination optical system of the scanning projection exposure apparatus also can include a wave plate which is rotatable about a traveling direction of the light.

摘要翻译： 扫描投影曝光装置在沿着扫描方向移动感光基板的同时将掩模的图案转印到感光基板上。 扫描投影曝光装置可以包括光学连接到光源的照明光学系统和布置在掩模和基板之间的光路中的投影光学系统。 照明光学系统以偏振方向沿着扫描方向和与扫描方向垂直的方向延伸的线偏振光照射掩模，而不损失光量。 扫描投影曝光装置的照明光学系统也可以包括能够围绕光的行进方向旋转的波片。

公开(公告)号：US06509954B1

公开(公告)日：2003-01-21

申请号：US09722515

申请日：2000-11-28

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato

IPC分类号： G03B2742

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An aperture stop that can be used in an exposure apparatus and method includes a central aperture region defined by a circular arc and a peripheral region having a decreased width.

摘要翻译： 可以用于曝光装置和方法的孔径光阑包括由圆弧限定的中心孔径区域和具有减小的宽度的周边区域。

公开(公告)号：US20060238729A1

公开(公告)日：2006-10-26

申请号：US11471658

申请日：2006-06-21

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/42

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

摘要翻译： 曝光装置包括多个投影光学系统，每个投影光学系统具有布置在第一表面和第二表面之间的光路中的光学元件，并且通过光学器件从第一表面形成辐射图案到第二表面上的曝光场 元素。 所述装置还包括相对于所述多个投影光学系统设置在所述第二表面的侧面中的可移动部分，所述多个投影光学系统在所述物体与所述投影光学系统的扫描曝光期间在第一方向上相对于所述曝光场保持要移动的物体 辐射图。 多个投影光学系统中的每一个在第二表面的一侧是远心的，并且曝光区域在与第一方向交叉的第二方向上布置在不同的位置。

公开(公告)号：US06556278B1

公开(公告)日：2003-04-29

申请号：US09722516

申请日：2000-11-28

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B2754

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An exposure/imaging apparatus and method effects projection exposure while moving a first object and a second object in a predetermined moving direction, effecting projection exposure of an image of the first object onto the second object. An adjusting member is used to adjust imaging characteristics of a projection optical system that is used to perform the projection exposure.

摘要翻译： 曝光/成像装置和方法在预定的移动方向上移动第一物体和第二物体时实现投影曝光，从而将第一物体的图像投射到第二物体上。 调整构件用于调整用于进行投影曝光的投影光学系统的成像特性。