- 专利标题： Polymers, resist compositions and patterning process
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申请号： US09947764申请日： 2001-09-07
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公开(公告)号： US06511787B2公开(公告)日： 2003-01-28
- 发明人: Yuji Harada , Jun Hatakeyama , Jun Watanabe , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
- 申请人： Yuji Harada , Jun Hatakeyama , Jun Watanabe , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Michitaka Ootani , Satoru Miyazawa , Kentaro Tsutsumi , Kazuhiko Maeda
- 优先权： JP2000-271234 20000907
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
An acrylic resin containing hexafluoroisopropanol units has high transmittance to VUV radiation. A resist composition using the resin as a base polymer has high transparency, substrate adhesion, alkali developability and acid-elimination capability and is suited for lithographic microprocessing.
公开/授权文献
- US20020048724A1 Polymers, resist compositions and patterning process 公开/授权日：2002-04-25
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