发明授权
- 专利标题: Bipolar transistor and manufacturing method thereof
- 专利标题(中): 双极晶体管及其制造方法
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申请号: US09689800申请日: 2000-10-13
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公开(公告)号: US06521974B1公开(公告)日: 2003-02-18
- 发明人: Katsuya Oda , Eiji Ohue , Masao Kondo , Katsuyoshi Washio , Masamichi Tanabe , Hiromi Shimamoto
- 申请人: Katsuya Oda , Eiji Ohue , Masao Kondo , Katsuyoshi Washio , Masamichi Tanabe , Hiromi Shimamoto
- 优先权: JP11-291808 19991014; JP2000-084708 20000322
- 主分类号: H01L2970
- IPC分类号: H01L2970
摘要:
A bipolar transistor according to the invention is provided with structure that an intrinsic base made of single crystal Si—Ge and a base leading-out electrode are connected via a link base made of polycrystal Si—Ge by doping at high concentration, further, a part immediately under the intrinsic base has the same conductive type as that of a collector and in a peripheral part, a single crystal Si—Ge layer having the same conductive type as that of a base is provided between the intrinsic base and a collector layer. Hereby, the reduction of the resistance of the link base between the intrinsic base and the base leading-out electrode and the reduction of capacitance between the collector and the base are simultaneously realized, and a self-aligned bipolar transistor wherein capacitance between an emitter and the base and capacitance between the collector and the base are respectively small, power consumption is small and high speed operation is enabled is acquired.
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